# US 12,181,657 B2 · Reflective two-dimensional spatial light modulators > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,181,657 B2 - Document ID: US12181657B2 - Status: Granted - Kind: B2 - Application number: 17/591,858 - Filed: 2022-02-03 - Published: 2022-08-11 - Granted: 2024-12-31 - Earliest claimed: 2021-02-05 - Assignees: Silicon Light Machines Corporation - Applicants: Silicon Light Machines Corporation - Inventors: Alexander Payne; James Hunter; Tianbo Liu - Web page: https://patentgrep.com/patent/US12181657B2 ## CPC - G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices} - B81B 7/0041: {maintaining a controlled atmosphere with techniques not provided for in B81B7/0038} - G02B 26/001: {based on interference in an adjustable optical cavity (interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26)} - G02B 26/023: {comprising movable attenuating elements, e.g. neutral density filters} - G02B 26/0808: {by means of one or more diffracting elements} - G02B 26/0841: {the reflecting element being moved or deformed by electrostatic means} - G03F 7/70191: {Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like} - B81B 2201/04: Optical MEMS - Y02P 10/25: Process efficiency - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B81B: MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES (piezoelectric, electrostrictive or magnetostrictive elements per se H10N30/00, H10N35/00) - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - Y02P: CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS ## Abstract A high-contrast two-dimensional Micro-Electromechanical System light modulator and methods of fabricating and operating the same in various applications is provided. Generally, the light modulator includes a single, deformable membrane suspended over a surface of a substrate by posts at corners thereof, the deformable membrane including an electrostatically deflectable patterned central portion (CP) and a number of flexures through which the CP is coupled to the posts. A membrane reflector is formed on a surface of the CP, and a substrate reflector over a surface of the substrate, and the substrate reflector exposed through void spaces between the posts, flexures and CP. The light modulator is operable so that when the membrane reflector is deformed into a non-planar surface by electrostatic deflection of the CP, and light reflected from the membrane reflector is brought into phase interference with light reflected from the substrate reflector. ## Claims ### Claim 1 A reflective two-dimensional (2D) Micro-Electromechanical System (MEMS) light modulator comprising: a deformable membrane suspended over a surface of a substrate by posts at corners thereof, the deformable membrane including an electrostatically deflectable patterned central portion (CP) and a number of flexures through which the CP is coupled to the posts; a membrane reflector including a deformable reflective surface formed on a surface of the CP; and a substrate reflector including a static reflective surface formed on a surface of the substrate below the membrane reflector, and exposed through void spaces between the posts, the number of flexures and the CP, wherein the membrane reflector is separated from the substrate reflector by a deflection gap selected so that when the deformable reflective surface is deformed into a non-planar surface by electrostatic deflection of the CP, light reflected from the membrane reflector is brought into phase interference with light reflected from the substrate reflector. ### Claim 2 (depends on 1) The 2D MEMS light modulator of claim 1 wherein when the CP is electrostatically deflected such that an integrated amplitude phasor of light reflected from the substrate reflector (Ãsubst) and an integrated amplitude phasor of light reflected from the membrane reflector (Ãmemb), sum in-phase (phase shift=0) to provide constructive interference and a bright state. ### Claim 3 (depends on 2) The 2D MEMS light modulator of claim 2 wherein a distance between the membrane reflector and substrate reflector in a state is selected so that in a quiescent state with the deformable reflective surface undeformed by electrostatic deflection of the CP, phasors Ãsubst and Ãmemb add destructively to achieve a low-reflectance dark state. ### Claim 4 (depends on 1) The 2D MEMS light modulator of claim 1 wherein when the CP is electrostatically deflected such that an integrated amplitude phasor of light reflected from the substrate reflector (Ãsubst), and an integrated amplitude phasor of light reflected from the membrane reflector (Ãmemb), sum anti-phase (phase shift=π) to provide destructive interference and a dark state. ### Claim 5 (depends on 2) The 2D MEMS light modulator of claim 2 wherein a distance between the membrane reflector and substrate reflector in a state is selected so that in a quiescent state with the deformable reflective surface undeformed by electrostatic deflection of the CP, phasors Ãsubst and Ãmemb add constructively to achieve a high-reflectance bright state. ### Claim 6 (depends on 1) The 2D MEMS light modulator of claim 1 wherein the deformable membrane comprises one or more of silicon (Si), silicon-nitride (SiN), silicon-germanium (SiGe), aluminum (Al), aluminum-silicon (AlSi), and aluminum-nitride (AlN). ### Claim 7 (depends on 1) The 2D MEMS light modulator of claim 1 wherein at least one of the deformable reflective surface and the static reflective surface comprise a Bragg mirror. ### Claim 8 (depends on 1) The 2D MEMS light modulator of claim 1 wherein the 2D MEMS light modulator is operable to modulate light ranging from deep ultraviolet light (DUV) to near-infrared (NIR) at wavelengths from 150 nm to 2 μm. ### Claim 9 (depends on 1) The 2D MEMS light modulator of claim 1 wherein modulated light from the 2D MEMS light modulator collected for transmission is either 0th order or 1st order. ### Claim 10 A method of fabricating a two-dimensional (2D) Micro-Electromechanical System (MEMS) light modulator, comprising: forming a substrate reflector including a static reflective surface formed over a surface of a substrate; forming a patterned sacrificial layer over the substrate reflector and surface of the substrate, the patterned sacrificial layer having a predetermined thickness and including a number of post openings extending through the patterned sacrificial layer to the surface of the substrate; forming a number of posts in the number of post openings; forming a deformable membrane over the number of posts and the patterned sacrificial layer; patterning the deformable membrane to form an electrostatically deflectable patterned central portion (CP) and a number of flexures through which the CP is coupled to the posts; forming a membrane reflector including a deformable reflective surface on a surface of the CP; and removing the patterned sacrificial layer to release the deformable membrane, wherein the CP is separated from the surface of the substrate by a deflection gap equal to the predetermined thickness of the patterned sacrificial layer, and wherein the predetermined thickness is selected so that when the deformable reflective surface is deformed into a non-planar surface by electrostatic deflection of the CP, light reflected from the membrane reflector is brought into phase interference with light reflected from the substrate reflector. ### Claim 11 (depends on 10) The method of claim 10 wherein forming the membrane reflector and substrate reflector comprises forming the membrane reflector and substrate reflector sized and shaped so that the 2D MEMS light modulator is operable in an active state with the deformable reflective surface deformed by electrostatic deflection of the CP, an integrated amplitude phasor of light reflected from the substrate reflector (Ãsubst), and an integrated amplitude phasor of light reflected from the membrane reflector (Ãmemb), sum in-phase (phase shift=0) to provide constructive interference and a bright state. ### Claim 12 (depends on 10) The method of claim 10 wherein forming the membrane reflector and substrate reflector comprises forming the membrane reflector and substrate reflector sized and shaped so that the 2D MEMS light modulator is operable in an active state with the deformable reflective surface deformed by electrostatic deflection of the CP, an integrated amplitude phasor of light reflected from the substrate reflector (Ãsubst), and an integrated amplitude phasor of light reflected from the membrane reflector (Ãmemb), sum anti-phase (phase shift=π) to provide destructive interference and a dark state. ### Claim 13 (depends on 10) The method of claim 10 wherein at least one of the deformable reflective surface or the static reflective surface comprise a Bragg mirror. ### Claim 14 (depends on 10) The method of claim 10 wherein removing the patterned sacrificial layer comprises two separate removal steps including: a partial removal of the sacrificial layer overlying the substrate reflector leaving a portion of the sacrificial layer underlying the CP in place; and full release of the deformable membrane after simultaneously forming the deformable reflective surface on the CP and the static reflective surface on the substrate reflector. ### Claim 15 (depends on 14) The method of claim 14 wherein simultaneously forming the deformable reflective surface on the CP and the static reflective surface on the substrate reflector comprises depositing a reflective metal. ### Claim 16 A system comprising: a light source operable to generate a light beam; a spatial light modulator (SLM) operable to modulate light incident thereon, the SLM including a multi-pixel, array of two-dimensional (2D) Micro-Electromechanical System (MEMS) light modulators, each 2D MEMS light modulator including: a deformable membrane suspended over a surface of a substrate by posts at corners thereof, the deformable membrane including an electrostatically deflectable patterned central portion (CP) and a number of flexures through which the CP is coupled to the posts; a membrane reflector including a deformable reflective surface formed on a surface of the CP; and a substrate reflector including a static reflective surface formed on a surface of the substrate below the membrane reflector, and exposed through void spaces between the posts, the number of flexures and the CP, wherein the membrane reflector is separated from the substrate reflector by a deflection gap selected so that when the deformable reflective surface is deformed into a non-planar surface by electrostatic deflection of the CP, light reflected from the substrate reflector is brought into phase interference with light reflected from the membrane reflector when the deformable reflective surface is deformed into a non-planar surface by electrostatic deflection of the CP; imaging optics operable to focus modulated light from the SLM onto a focal plane of the system; and a controller operable to control the light source, SLM and imaging optics to modulate light incident thereon and to focus and scan the modulated light across the focal plane. ### Claim 17 (depends on 16) The system of claim 16, wherein the system is an additive manufacturing system further comprising: a vat into which material being added together is introduced; and a transport mechanism to raise and lower a work surface, on which an object is to be manufactured into the vat, wherein the focal plane is on a surface of the material in the vat, and wherein the controller is further operable to control operation of the transport mechanism. ### Claim 18 (depends on 16) The system of claim 16, wherein the system is a surface modification system, the focal plane is on a surface of a workpiece, the light source is a laser, and wherein the imaging optics is operable to focus a substantially linear swath of modulated light onto the surface of the workpiece, the linear swath comprising light from multiple pixels of the SLM, and wherein the controller is operable to control the SLM, laser and imaging optics to mark the surface of the workpiece to record an image thereon. ### Claim 19 (depends on 16) The system of claim 16, wherein the system is a thermal, computer-to-plate (CtP) printing system the focal plane is on a photosensitive surface of a substrate, the light source is a laser, and wherein the imaging optics is operable to focus a substantially linear swath of modulated light onto the photosensitive surface of the substrate, the linear swath comprising light from multiple pixels of the SLM, and wherein the controller is operable to control the SLM, laser and imaging optics to print to the surface of the substrate to record an image thereon.