Hybrid pulsed laser deposition of complex oxide thin films made from elements having a large vapor pressure mismatch
AssigneeWisconsin Alumni Research Foundation
InventorsChang-Beom Eom, Jungwoo Lee, Jieun Kim
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Abstract
Apparatus and methods for growing films of complex layered metal oxides with high stoichiometries and high crystal qualities are provided. The layered complex metal oxides include two or more metals and oxygen and have a layered structure. The methods, which are referred to as hybrid pulsed laser deposition (hybrid PLD), synergistically combine the advantages of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) to grow complex metal oxide films that include metals with very different vapor pressures.
Claims16
A method of forming a film of a layered complex oxide, the method comprising:
- providing a deposition substrate and a solid metal oxide target comprising oxygen and a first metal in a vacuum chamber;
- forming a molecular beam directed at the deposition substrate, wherein the molecular beam is formed by evaporation of an oxide of a second metal, the second metal having a higher vapor pressure than the first metal;
- and
- laser ablating the solid metal oxide target using a pulsed laser to generate a plume of ablated target material in the presence of the molecular beam, wherein the film of the layered complex oxide is grown epitaxially on the deposition substrate via layer-by-layer deposition from the plume of ablated target material and the molecular beam.
Dependencies are inferred from the claim text.