Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes

A chromatographic column, comprising:

• an uncoated tube comprising stainless steel or titanium or both;
• and
• a coated frit comprising a coating, wherein the coating is vapor deposited from an alkylsilyl precursor, the alkylsilyl precursor having a structure of Formula I:
• wherein
• at least one of R1, R2, R3, R4, R5, and R6 is ORA;
• when R1, R2, R3, R4, R5, and R6 are not ORA, then R1, R2, R3, R4, R5, and R6 are each independently selected from (C1-C6)alkoxy, —NH(C1-C6)alkyl, —N((C1-C6)alkyl)2, OH, and halo;
• RA represents a point of attachment to the interior surfaces of the fluidic system;
• and
• X is (C1-C20)alkyl, —O[(CH2)2O]1-20—, —(C1-C10)[NH(CO)NH(C1-C10)]1-20—, or —(C1-C10)[alkylphenyl(C1-C10)alkyl]1-20—, and the coated frit is disposed proximate to an inlet of the tube,
• wherein the uncoated tube does not have the coating, and
• the coating reduces binding of one or more sample components to the coated frit relative to binding of the one or more sample components to the uncoated tube.