Process for preparing chlorosilanes
AssigneeWacker Chemie AG
InventorsKarl-Heinz Rimboeck, Tassilo Freiherr von Aretin, Johannes Sundberg
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Abstract
The present disclosure relates to a process for producing chlorosilanes in a fluidized bed reactor by reacting a hydrogen chloride-containing reaction gas with a particulate contact mass containing silicon and optionally a catalyst. The chlorosilanes have the general formula HnSiCl4-n and/or HmCl6-mSi2. The reactor design is described by an index K1, the constitution of the contact mass without catalyst is described by an index K2uncat, the constitution of the contact mass with catalyst is described by an index K2cat, and the reaction conditions are described by an index K3.
Claims17
A process for producing chlorosilanes in a fluidized bed reactor, comprising:
- reacting a hydrogen chloride-containing reaction gas with a particulate contact mass containing silicon and optionally a catalyst, wherein the chlorosilanes have the general formula HnSiCl4-n and/or HmCl6-mSi2 where n=1-3 and m=0-4, and
- wherein the reactor design is described by an index
- K
-
-
- 1
- =
- φ
- ·
- V
- reactor
- ,
-
- eff
- A
- tot
- ,
-
- cooled
- ·
- d
- hyd
- wherein φ is a fill level of the reactor;
- wherein Vreactor, eff is an effective volume of the reactor [m3];
- wherein Atot, cooled is a sum of cooled surface areas in the reactor [m2];
- wherein dhyd is a reactor diameter [m];
- and
- wherein Vreactor, eff=1 to 60 m3 and dhyd=0.7 to 1.8 m;
- wherein the constitution of the contact mass without the catalyst is described by an index
- K
-
-
- 2
- uncat
- =
- R
- Si
- ·
- B
- AK
- d
- 32
- wherein BAK is a breadth of the particle size distribution of the contact mass [μm];
- wherein d32 is a particle Sauter diameter [μm];
- wherein RSi is a purity of the silicon;
- and
- wherein BAK is 10 to 1500 μm and d32 is 10 to 1000 μm;
- wherein the constitution of the contact mass with catalyst is described by an index
- K
-
-
- 2
- cat
- =
- δ
- rel
- R
- si
- ;
- wherein δrel is a relative catalyst distribution in the contact mass;
- wherein δrel is 0.005 to 3;
- and
- wherein RSi is 0.75 to 0.9999;
- wherein the reaction conditions are described by an index
- K
-
-
- 3
- =
- u
- L
- v
- F
- ·
- 10
- 6
- ·
- p
- diff
- g
- ·
- 1
- ρ
- F
- wherein uL is a superficial gas velocity [m/s] of the gaseous reaction mixture in an interior of the reactor;
- wherein νF is a kinematic viscosity [m2/s] of gaseous reaction mixture measured at the temperature in the interior of the reactor;
- wherein ρF is a density [kg/m3] of the gaseous reaction mixture in the portion of the reactor in which the fluidized bed is formed;
- wherein pdiff is a pressure drop over fluidized bed [kg/m*s2];
- and
- wherein uL is 0.05 to 4 m/s, νF is 3*10-6 to 2/5*10-5 m2/s, ρF is 1.5 to 5 kg/m3 and pdiff is 10 000 to 400 000 kg/m*s2;
- wherein K1 has a value of 1 to 10, wherein K2uncat has a value of 0.1 to 10 or wherein K2cat has a value of 0.005 to 3;
- and
- wherein K3 has a value of 1 to 700.
Dependencies are inferred from the claim text.