Polishing liquid supply system

A polishing liquid supply system, comprising:

• a polishing liquid preparation device, a cleaning liquid supply device and a filtering device, and further comprising a supply pipeline connected with the polishing liquid preparation device and the filtering device, and a cleaning pipeline connected with the cleaning liquid supply device and the filtering device, wherein the filtering device comprises at least a first filtering device and a second filtering device;
• the polishing liquid preparation device being configured to prepare a polishing liquid and convey the prepared polishing liquid to the filtering device through the supply pipeline;
• the filtering device being configured to filter the polishing liquid and convey the filtered polishing liquid to a polishing device connected with the filtering device;
• and the cleaning liquid supply device being configured to convey a cleaning liquid to the filtering device through the cleaning pipeline;
• and, wherein
• the supply pipeline and the cleaning pipeline are connected to a bottom of the filtering device, a top of the filtering device is further provided with a drain pipeline, and wherein the drain pipeline is configured to convey the filtered polishing liquid outputted from the filtering device to the polishing device;
• the supply pipeline comprises a first pipeline connected with the polishing liquid preparation device and the first filtering device, and a second pipeline connected with the polishing liquid preparation device and the second filtering device;
• and
• the cleaning pipeline comprises a third pipeline connected with the cleaning liquid supply device and the first filtering device, and a fourth pipeline connected with the cleaning liquid supply device and the second filtering device.