Back to results
US 12,176,175 B2Granted
Electron beam generation source, electron beam emission device, and x-ray emission device
AssigneeHamamatsu Photonics K.K.
InventorsDai Haraguchi, Yoshito Hasegawa
Life of this patent
Estimating the term…
Abstract
Disclosed is an electron beam generation source including: an electron discharge part extending on a desired axis and configured to discharge electrons; a movable part connected to one end of the electron discharge part; a support part configured to support the movable part to be movable along the axis; and a tension holding part configured to hold tension of the electron discharge part by applying a pressing force or a tensile force to the movable part. The movable part and the tension holding part are disposed on the axis.
Claims10
An electron beam generation source comprising:
- an electron discharge part extending on a desired axis and configured to discharge electrons;
- a movable part connected to one end of the electron discharge part;
- a support part configured to support the movable part to be movable along the axis;
- and
- a tension holding part configured to hold tension of the electron discharge part by applying a pressing force or a tensile force to the movable part, wherein
- the movable part and the tension holding part are disposed on the axis,
- the support part includes a housing part having an internal space for accommodating the tension holding part inside,
- the housing part includes a movable part holding part that extends along the axis and holds the movable part to be movable along the axis,
- the movable part holding part is a through hole extending along the axis and having a circular column shape, and
- the tension holding part is arranged on the opposite side of the end to which the electron discharge part is connected in the movable part.
7 more elements
Dependencies are inferred from the claim text.