Water-resistant nanofilm, preparation method and article thereof
AssigneeJiangsu Favored Nanotechnology Co., Ltd.
InventorJian Zong
Life of this patent
Estimating the term…
Abstract
The present disclosure provides a water-resistant nanofilm, a preparation method and an article thereof, in which fluorocarbon gas is used as a plasma source and is formed on a substrate surface of substrate by a plasma enhanced chemical vapor deposition method, so that the water-resistance performance of the substrate surface is improved.
Claims10
A water-resistant nanofilm, wherein the water-resistant nanofilm is formed on a surface of a substrate by plasma enhanced chemical vapor deposition through using fluorocarbon gas as plasma source,
- wherein the fluorocarbon gas has a structural formula selected from CxF2x+2 and CxF2x, and x is 1, 2 or 3,
- wherein the water-resistant nanofilm is formed of one, two or three selected from a group consisting of monomer 1, monomer 2 and monomer 3 as reaction materials for vapor deposition,
- wherein the monomer 1 has a structural formula (I):
- Y—CmH2m—CnF2n+1 (I)
- where m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 12, and Y represents an organic functional group and is selected from the following structure:
- vinyl, halogened vinyl, alkyl substituted vinyl, acrylate group, C═C—O—C(O), methacrylate group, and, hydroxyl,
- and the monomer 2 has a structural formula (II)
- where R1, R2, R3, R4, R5 and R6 are respectively selected from hydrogen, alkyl, aryl, halogenated aryl, halogen, halogenated alkyl, alkoxy and vinyl, and k is an integer ranging from 0 to 4,
- and the monomer 3 comprises one or more selected from a group consisting of glycidyl methacrylate, allyl glycidyl ether, 1,2-epoxy-4-vinyl cyclohexane, 3-(2,3-epoxy-propoxy) propyl vinyl dimethoxysilane and enbucrilate, or the monomer 3 has a structural formula (III),
- where R7, R8, R9, R10, R11 and R12 are respectively selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl, and halogenated aryl, and i as well as h are integers ranging from 0 to 10 but not both be 0 in the meantime, and R13 represents bond, —CO—, —COO—, arylene, alicyclic alkylene or hydroxyl substituted aliphatic alkylene,
- wherein a thickness of the water-resistant nanofilm ranges from 10 to 2000 nm.
An article comprising a water-resistant nanofilm, wherein the article is prepared by exposing the article to plasma source which contains a structural formula CxF2x+2 or CxF2x, and forming the water-resistant nanofilm on at least a part of surfaces of the article from reaction materials by plasma enhanced chemical vapor deposition, wherein x is 1, 2 or 3,
- wherein the water-resistant nanofilm is formed of one, two or three selected from a group consisting of monomer 1, monomer 2 and monomer 3 as reaction materials for vapor deposition,
- wherein the monomer 1 has a structural formula (I):
- Y—CmH2m—CnF2n+1 (I)
- where m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 12, and Y represents an organic functional group and is selected from the following structure:
- vinyl, halogened vinyl, alkyl substituted vinyl, acrylate group, C—C—O—C(O), methacrylate group, and, hydroxyl,
- and the monomer 2 has a structural formula (II)
- where R1, R2, R3, R4, R5 and R6 are respectively selected from hydrogen, alkyl, aryl, halogenated aryl, halogen, halogenated alkyl, alkoxy and vinyl, and k is an integer ranging from 0 to 4, and the monomer 3 comprises one or more selected from a group consisting of glycidyl methacrylate, allyl glycidyl ether, 1,2-epoxy-4-vinyl cyclohexane, 3-(2,3-epoxy-propoxy) propyl vinyl dimethoxysilane and enbucrilate, or the monomer 3 has a structural formula (III),
- where R7, R8, R9, R10, R11 and R12 are respectively selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl, and halogenated aryl, and i as well as h are integers ranging from 0 to 10 but not both be 0 in the meantime, and R13 represents bond, —CO—, —COO—, arylene, alicyclic alkylene or hydroxyl substituted aliphatic alkylene,
- wherein a thickness of the water-resistant nanofilm ranges from 10 to 2000 nm.
Dependencies are inferred from the claim text.