Anti-stiction enhancement of ruthenium contact

A method of manufacturing a MEMS device, comprising:

• forming a substrate comprising a radio frequency, RF, electrode, the RF electrode having a first contact surface comprising ruthenium, wherein a first anchor electrode is disposed over the substrate and wherein a second anchor electrode is disposed over the substrate, wherein the RF electrode is disposed in the substrate between the first and the second anchor electrodes, and wherein a pull-up electrode is disposed over a beam structure between the first and the second anchor electrodes;
• forming the beam structure within a cavity, wherein the cavity is disposed over the substrate, wherein:
• the beam structure includes a contact portion having a second contact surface comprising ruthenium, the contact portion is disposed over the first contact surface of the RF electrode and the second contact surface is operable to contact the first contact surface when the beam structure is in a pulled-down state;
• and
• the cavity contains sacrificial material;
• removing the sacrificial material from the cavity to free the beam structure to move within the cavity, wherein the first contact surface and the second contract surface are exposed in the cavity and the second contact surface of the contact portion is operable to contact the first contact surface of the RF electrode when the beam structure is in the pulled-down state;
• introducing fluorine into the cavity such that the first contact surface that comprises the ruthenium is modified by the fluorine and the second contact surface that comprises the ruthenium is modified by the fluorine;
• and
• sealing the cavity.