Chamber components with polished internal apertures

A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment, the chamber component comprising:

• a ceramic article having a plurality of polished apertures therein, wherein a roughness of the plurality of polished apertures is less than 32 μin, wherein at least one aperture of the plurality of polished apertures was polished by flowing an abrasive media through the at least one aperture, wherein the abrasive media comprises a polymer base and a plurality of abrasive particles, and wherein a viscosity of the abrasive media is between about 150,000 cP and about 750,000 cP.