Antiperspirant composition comprising inorganic polyionic cluster
AssigneeConopco, Inc.
InventorsXiaoke Li, Renjiang Liu, Yuekui Sun, Jinfang Wang, Meili Zhang, Huanjun Zhou
Life of this patent
Estimating the term…
Abstract
The present invention is in the field of antiperspirant compositions, in particular, compositions comprising antiperspirant actives. Disclosed is an anhydrous antiperspirant composition comprising an inorganic polyionic cluster having structure of (I) or (II); where M is Ca or Mg; and wherein the composition is substantially free of abrasives, which means less than 3.0% by weight of the composition; wherein anhydrous means the water content of the composition is less than 3.0%.
Claims20
An anhydrous antiperspirant composition comprising an inorganic polyionic cluster having structure of (I);
- where M is Ca or Mg;
- wherein the anhydrous antiperspirant composition comprises 0.1 to 70% by weight of the inorganic polyionic cluster;
- wherein the anhydrous antiperspirant composition comprises less than 3.0% abrasive by weight of the composition;
- and
- further wherein the anhydrous composition contains less than 3.0% water by weight of the composition.
An anhydrous antiperspirant composition comprising an inorganic polyionic cluster having structure of (I);
- where M is Ca or Mg;
- wherein the anhydrous antiperspirant composition comprises a fragrance, a preservative, or a combination thereof;
- wherein the anhydrous antiperspirant composition comprises less than 3.0% abrasive by weight of the composition;
- and
- further wherein the anhydrous composition contains less than 3.0% water by weight of the composition.
Dependencies are inferred from the claim text.