Laser irradiation apparatus, laser irradiation method, container, and containment body
AssigneeRicoh Company, Ltd.
InventorsKazuhiro Fujita, Rie Hirayama
Life of this patent
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Abstract
A laser irradiation apparatus includes: multiple irradiation units each to emit a laser beam to a surface of a base to form a pattern, the multiple irradiation units, including: a first irradiation unit to emit a first laser beam; and a second irradiation unit to emit a second laser beam; and a circuitry to: control the first irradiation unit to irradiate only a first irradiation region on a surface of a base with the first laser beam; and control the second irradiation unit to irradiate only a second irradiation region on the surface of the base with the second laser beam. The first irradiation region and the second irradiation region are not overlapping each other.
Claims20
A laser irradiation apparatus, comprising:
- a first irradiation source configured to emit a first laser beam to a surface of a container to form a first pattern including at least one of a character, a code, a figure or an image;
- a second irradiation source configured to emit a second laser beam to the surface of the container to form a second pattern including at least one of a character, a code, a figure or an image;
- and
- a circuitry configured to:
- control the first irradiation source to irradiate only a first irradiation region on the surface of the container with the first laser beam;
- and
- control the second irradiation source to irradiate only a second irradiation region on the surface of the container with the second laser beam, wherein
- the first irradiation region and the second irradiation region do not overlap,
- the first irradiation source is configured to form the first pattern and the second irradiation source is configured to form the second pattern using multiple different writing conditions, and
- each writing condition of the multiple different writing conditions corresponds to identification information.
A laser irradiation apparatus, comprising:
- a first irradiation source configured to emit a first laser beam to a surface of a bottle to form a first pattern including at least one of a character, a code, a figure or an image;
- a second irradiation source configured to emit a second laser beam to the surface of the bottle to form a second pattern including at least one of a character, a code, a figure or an image;
- and
- a circuitry configured to:
- control the first irradiation source to irradiate only a first irradiation region on the surface of the bottle with the first laser beam;
- and
- control the second irradiation source to irradiate only a second irradiation region on the surface of the bottle with the second laser beam, wherein
- the first irradiation region and the second irradiation region do not overlap,
- the first irradiation source is configured to form the first pattern and the second irradiation source is configured to form the second pattern using multiple different writing conditions, and
- each writing condition of the multiple different writing conditions corresponds to identification information.
A laser irradiation apparatus, comprising:
- a first irradiation source configured to emit a first laser beam to a surface of a resin object to form a first pattern including at least one of a character, a code, a figure or an image;
- a second irradiation source configured to emit a second laser beam to the surface of the resin object to form a second pattern including at least one of a character, a code, a figure or an image;
- and
- a circuitry configured to:
- control the first irradiation source to irradiate only a first irradiation region on the surface of the resin object with the first laser beam;
- and
- control the second irradiation source to irradiate only a second irradiation region on the surface of the resin object with the second laser beam, wherein
- the first irradiation region and the second irradiation region do not overlap,
- the first irradiation source is configured to form the first pattern and the second irradiation source is configured to form the second pattern using multiple different writing conditions, and
- each writing condition of the multiple different writing conditions corresponds to identification information.
Dependencies are inferred from the claim text.