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US 12,139,811 B2Granted
Carrier foil-attached metal foil, method of manufacturing the same, and laminate including the same
AssigneeYmt Co., Ltd.
InventorsHyun Woo Jeon, Bo Mook Chung, Sung Wook Chun
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Abstract
The present invention relates to a carrier foil-attached metal foil including a release layer having a specific composition and structure, a method of manufacturing the carrier foil-attached metal foil, and a laminate for forming a printed circuit board including the carrier foil-attached metal foil. The laminate for forming a printed circuit board according to the present invention comprises the carrier foil-attached metal foil, so that a defect rate can be minimized.
Claims3
A method of manufacturing a carrier foil-attached metal foil, comprising:
- preparing a carrier foil, wherein the carrier foil includes copper or aluminum;
- forming an alloy layer on the carrier foil by electrolytic plating or electroless plating, wherein the alloy layer has a thickness 30 nm to 1 μm;
- forming an organic layer on the alloy layer, wherein the organic layer has a thickness 1 nm to 50 nm;
- forming a metal layer on the organic layer, and
- forming a surface roughening layer on the metal layer,
- wherein,
- the alloy layer is formed from a plating solution including a first component containing nickel (Ni) and a second component containing molybdenum (Mo), wherein the alloy layer comprises the first component and the second component and a ratio of the first component and the second component in the alloy layer is a weight ratio of 60 to 80:40 to 20,
- the organic layer is formed from coating a coating solution including a cyclic compound containing two or more nitrogen atoms by immersion, showering, or spray method,
- the nickel (Ni) of the alloy layer prevents the copper or the aluminum of the carrier foil from diffusing into the metal layer,
- the molybdenum (Mo) provides a site where the cyclic compound is bonded,
- the surface roughening layer is formed by going through a primary electroplating and a secondary electroplating,
- the primary electroplating is performed using a first electroplating solution containing 60 to 70 g/L of copper and 150 to 170 g/L of sulfuric acid, and
- the secondary electroplating is performed using a second electroplating solution containing 220 to 240 g/L of copper and 120 to 140 g/L of sulfuric acid.
10 more elements
Dependencies are inferred from the claim text.