CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same

A CMP slurry composition for polishing a tungsten pattern wafer, the CMP slurry composition comprising:

• a solvent, the solvent being a polar solvent or a non-polar solvent;
• about 0.001 wt % to about 20 wt % of an abrasive agent;
• about 0.001 wt % to about 10 wt % of a catalyst;
• about 0.001 wt % to about 20 wt % of an organic acid;
• and
• about 0.001 wt % to about 1 wt % of a biocide,
• wherein:
• the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms,
• the biocide includes a compound of Formula 4:
• in Formula 4,
• X4 is a halogen or a halogen-containing monovalent organic group;
• X5 is a cyano group (—C≡N), a nitro group (—NO2), a cyano group-containing monovalent organic group, or a nitro group-containing monovalent organic group, and
• Y8 and Y9 are each independently a hydrogen atom, a halogen, a cyano group, a nitro group, a hydroxyl group, a substituted or unsubstituted C1 to C20 alkyl group, or —C(═O)—NZ1Z2, in which Z1 and Z2 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
• the silane containing two nitrogen atoms includes a compound of Formula 1, a cation derived from the compound of Formula 1, or a salt of the compound of Formula 1:
• in Formula 1,
• X1, X2 and X3 are each independently a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryloxy group, at least one of X1, X2 and X3 being a hydroxyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryloxy group;
• Y1 and Y2 are each independently a bivalent aliphatic hydrocarbon group, a bivalent alicyclic hydrocarbon group, or a bivalent aromatic hydrocarbon group;
• and
• R1, R2 and R3 are each independently a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1 to C20 monovalent aliphatic hydrocarbon group, a substituted or unsubstituted C3 to C20 monovalent alicyclic hydrocarbon group, or a substituted or unsubstituted C6 to C30 monovalent aromatic hydrocarbon group,
• the silane containing three nitrogen atoms includes a compound of Formula 2, a cation derived from the compound of Formula 2, or a salt of the compound of Formula 2:
• in Formula 2,
• X1, X2 and X3 are each independently a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C7 to C20 arylalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryloxy group, at least one of X1, X2 and X3 being a hydroxyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryloxy group;
• Y3, Y4 and Y5 are each independently a single bond, a bivalent aliphatic hydrocarbon group, a bivalent alicyclic hydrocarbon group, or a bivalent aromatic hydrocarbon group;
• and
• R6, R7, R8 and R9 are each independently a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1 to C20 monovalent aliphatic hydrocarbon group, a substituted or unsubstituted C3 to C20 monovalent alicyclic hydrocarbon group, or a substituted or unsubstituted C6 to C30 monovalent aromatic hydrocarbon group.