Pressure control device and substrate treatment apparatus including the same
AssigneeSemes Co., Ltd.
InventorsDong Hwa Lee, Dai Geon Yoon, Bong Man Choi, Jong Suk Won, Hyeong Jun Cho
Life of this patent
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AssigneeSemes Co., Ltd.
InventorsDong Hwa Lee, Dai Geon Yoon, Bong Man Choi, Jong Suk Won, Hyeong Jun Cho
Estimating the term…
Provided is a pressure control device for stably controlling the internal air pressure of a reservoir. The pressure control device includes: an input terminal receiving source air pressure; an intake valve connected between the input terminal and an output terminal; an exhaust valve connected to the output terminal; a pressure sensor connected to the output terminal and generating a sensed value by sensing pressure at the output terminal; and a controller simultaneously operating the intake valve and the exhaust valve by simultaneously operating a first control loop for adjusting the degree of opening of the intake valve by comparing the sensed value with a first target value and a second control loop for adjusting the degree of opening of the exhaust valve by comparing the sensed value with a second target value.
A pressure control device comprising:
A pressure control device comprising:
A substrate treatment apparatus comprising:
Dependencies are inferred from the claim text.