Temperature distribution evaluation method, temperature distribution evaluation device, and soaking range evaluation method

A temperature distribution evaluation device, comprising:

• a temperature distribution evaluation unit that is disposed in a heating region included in a heating device;
• wherein the temperature distribution evaluation unit includes a first semiconductor substrate and a release and reception body that faces the first semiconductor substrate and transports a raw material by heating;
• wherein the release and reception body is a second semiconductor substrate, or at least a part of a storage container that stores the first semiconductor substrate.

A soaking range evaluation method, comprising:

• heating, in a heating region of a heating device, a semiconductor substrate and a release and reception body that transports a raw material to the semiconductor substrate at a plurality of measurement points in the heating region;
• and evaluating a soaking range of the heating region based on a substrate thickness change amount of the semiconductor substrate;
• wherein the raw material is a sublimation gas generated from at least one of the semiconductor substrate or the release and reception body.