Back to results
US 12,129,548 B2Granted
Method of forming structures using a neutral beam
AssigneeASM IP Holding B.V.
InventorsTomohiro Kubota, Mitsuya Utsuno, Toshihisa Nozawa, Seiji Samukawa, Hua Hsuan Chen
Life of this patent
Estimating the term…
Abstract
Methods of forming structures using a neutral beam, structures formed using a neutral beam, and reactor systems for forming the structures are disclosed. The neutral beam can be used to provide activated species during deposition of a layer and/or to provide activated species to treat a deposited layer.
Claims18
A method of forming a structure in a reaction chamber, the method comprising the steps of:
- forming a layer on a surface of a substrate using one or more of NBEALD or NBECVD;
- forming a neutral beam generated from one or more gases;
- and
- exposing the layer on the surface of the substrate to species generated from the neutral beam,
- wherein a neutral beam apparatus comprising an aperture plate is used to form the neutral beam, and wherein the step of exposing the layer further comprises applying a bias power density to the aperture plate.
2 more elements
A method of forming a structure in a reaction chamber, the method comprising the steps of:
- forming a layer on a surface of a substrate using one or more of using one or more of PEALD, PECVD, NBEALD or NBECVD;
- forming a neutral beam generated from one or more gases;
- and
- exposing the layer on the surface of the substrate to species generated from the neutral beam,
- wherein the layer on the surface of the substrate comprises one or more of SiN, SiOC, SiCN, SiC, SiOCN, SiBN, SiBO, GeOx, GeN, TiO2, or TaO2,
- wherein a neutral beam apparatus comprising an aperture plate is used to form the neutral beam, and wherein the step of exposing the layer further comprises applying a bias power density to the aperture plate.
3 more elements
A method of forming a structure, the method comprising the steps of:
- providing a substrate within a reaction chamber;
- providing a precursor to a gas inlet of the reaction chamber to form adsorbed species on a surface of the substrate;
- providing a reactant to a gas inlet of a plasma chamber;
- forming a neutral beam from species generated in the plasma chamber using a neutral beam apparatus;
- and
- exposing the adsorbed species to species from the neutral beam, wherein a neutral beam apparatus comprising an aperture plate is used to form the neutral beam, and wherein the step of exposing the layer further comprises applying a bias power density to the aperture plate.
3 more elements
Dependencies are inferred from the claim text.