Lithographic apparatus and ultraviolet radiation control system
AssigneeASML Holding N.V.
InventorAlexander Kremer
Life of this patent
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Abstract
The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.
Claims20
An ultraviolet radiation control system, comprising:
- a housing;
- a conversion crystal, disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation;
- a plurality of photodetectors configured to detect an intensity of a scattered portion of the fluorescent radiation;
- and
- at least one diffusive surface, disposed on or in a flat surface of the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.
A method for detecting radiation, comprising:
- receiving ultraviolet radiation at a conversion crystal, wherein the conversion crystal is configured to convert the ultraviolet radiation to a fluorescent radiation;
- and
- detecting an intensity of a scattered portion of the fluorescent radiation using a plurality of photodetectors,
- wherein at least one diffusive surface is disposed on or in a flat surface of the conversion crystal to increase the intensity of the scattered portion of the fluorescent radiation.
Dependencies are inferred from the claim text.