Carboxylate, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsMasahiko Shimada, Koji Ichikawa
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AssigneeSumitomo Chemical Company, Limited
InventorsMasahiko Shimada, Koji Ichikawa
Estimating the term…
Provided are a carboxylate capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. Disclosed are a carboxylate represented by formula (I) and a resist composition: wherein Ar represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, X1 represents an oxygen atom or a sulfur atom, R1 represents a halogen atom or a haloalkyl group having 1 to 12 carbon atoms, R2 represents a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH2— included in the haloalkyl group and the alkyl group may be replaced by —O— or —CO—, m1 represents an integer of 1 to 6, m2 represents an integer of 0 to 4, and Z+ represents an organic cation.
A resist composition comprising
A carboxylate represented by formula (I):
A carboxylate represented by formula (I):
Dependencies are inferred from the claim text.