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US 12,122,941 B2Granted
Liquid metal precursor solution, method for manufacturing metal film using the same, and electronic device including the same
AssigneeKorea Advanced Institute of Science and Technology
InventorsSteve Park, Hyeonji Kim, Gun-Hee Lee, Jae-Woong Jeong
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Abstract
The present disclosure provides a liquid metal precursor solution, including: metal precursor particles including metal particles and a polymer film surrounding the metal particles; and a solvent mixed with the metal precursor particles, wherein each of the polymer film and the solvent includes a functional group having electrostatic repulsion force to each other so that the metal precursor particles may be dispersed in the solvent.
Claims10
A liquid metal precursor solution, comprising:
- metal precursor particles comprising metal particles and a polymer film surrounding the metal particles;
- and
- a solvent mixed with the metal precursor particles,
- wherein each of the polymer film and the solvent comprises a functional group having electrostatic repulsion force to each other so that the metal precursor particles may be dispersed in the solvent,
- wherein the polymer film comprises sulfonate, and the solvent comprises carboxylate.
2 more elements
Dependencies are inferred from the claim text.