# US 12,120,904 B2 · Display device and method of manufacturing the same

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- Number: US 12,120,904 B2
- Document ID: US12120904B2
- Status: Granted
- Kind: B2
- Application number: 17/379,009
- Filed: 2021-07-19
- Published: 2022-05-26
- Granted: 2024-10-15
- Earliest claimed: 2020-11-20
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., Ltd.
- Inventors: Jaeheung Ha; Jongwoo Kim; Changyeong Song; Woosuk Jung; Yongchan Ju; Heeyeon Park; Hyein Yang
- Web page: https://patentgrep.com/patent/US12120904B2

## CPC

- H10K 59/879: {comprising refractive means, e.g. lenses}
- H10K 59/8731: {multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers}
- H10K 59/12: Active-matrix OLED [AMOLED] displays
- H10K 2102/351: {Thickness}
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A display device includes a substrate, a light emitting element disposed on the substrate, a capping layer covering the light emitting element, and an encapsulation layer disposed on the capping layer. The capping layer includes a first inorganic layer, a first flexible layer disposed on the first inorganic layer, and a second inorganic layer disposed on the first flexible layer. The first flexible layer includes silicon and carbon. A thickness of the first flexible layer is about 80% or more of a thickness of the capping layer.

## Claims

### Claim 1

A display device, comprising:
a substrate;
a light emitting element disposed on the substrate;
a capping layer covering the light emitting element; and
an encapsulation layer disposed on the capping layer,
wherein the capping layer comprises:
a first inorganic layer;
a first flexible layer disposed on the first inorganic layer, the first flexible layer including silicon and carbon; and
a second inorganic layer disposed on the first flexible layer,
wherein a thickness of the first flexible layer is about 80% or more of a thickness of the capping layer.

### Claim 2 (depends on 1)

The display device of claim 1,
wherein each of a refractive index of the first inorganic layer, a refractive index of the first flexible layer, and a refractive index of the second inorganic layer is about 1.75 or more.

### Claim 3 (depends on 1)

The display device of claim 1,
wherein a difference between a refractive index of the first inorganic layer and a refractive index of the first flexible layer is about 0.15 or less, and
a difference between the refractive index of the first flexible layer and a refractive index of the second inorganic layer is about 0.15 or less.

### Claim 4 (depends on 3)

The display device of claim 3,
wherein the refractive index of the first inorganic layer is larger than the refractive index of the first flexible layer, and
the refractive index of the second inorganic layer is larger than the refractive index of the first flexible layer.

### Claim 5 (depends on 1)

The display device of claim 1,
wherein the capping layer has a thickness from about 50 nm to about 90 nm.

### Claim 6 (depends on 5)

The display device of claim 5,
wherein each of the first inorganic layer and the second inorganic layer has a thickness from about 0.1 nm to about 7.0 nm.

### Claim 7 (depends on 1)

The display device of claim 1,
wherein each of the first inorganic layer and the second inorganic layer comprises SiNx, and
wherein the first flexible layer comprises SiCN.

### Claim 8 (depends on 1)

The display device of claim 1,
wherein the encapsulation layer comprises an organic encapsulation layer and an inorganic encapsulation layer disposed on the organic encapsulation layer, and
wherein a lower surface of the organic encapsulation layer is in direct contact with an upper surface of the capping layer.

### Claim 9 (depends on 1)

The display device of claim 1,
wherein the capping layer further comprises:
a second flexible layer disposed on the second inorganic layer, the second flexible layer comprising silicon and carbon; and
a third inorganic layer disposed on the second flexible layer, and
wherein a sum of the thickness of the first flexible layer and a thickness of the second flexible layer is about 80% or more of the thickness of the capping layer.

### Claim 10 (depends on 9)

The display device of claim 9,
wherein the capping layer has a thickness from about 50 nm to about 90 nm.

### Claim 11 (depends on 9)

The display device of claim 9,
wherein a difference of a refractive index of the first inorganic layer and a refractive index of the first flexible layer is about 0.15 or less,
wherein a difference of the refractive index of the first flexible layer and a refractive index of the second inorganic layer is about 0.15 or less,
wherein a difference of the refractive index of the second inorganic layer and a refractive index of the second flexible layer is about 0.15 or less, and
wherein a difference of the refractive index of the second flexible layer and a refractive index of the third inorganic layer is about 0.15 or less.

### Claim 12

A method of manufacturing a display device, the method comprising:
forming a light emitting element on a substrate;
forming a capping layer on the light emitting element; and
forming an encapsulation layer on the capping layer,
wherein forming the capping layer on the light emitting element comprises:
forming a first inorganic layer;
forming a first flexible layer on the first inorganic layer, the first flexible layer including silicon and carbon; and
forming a second inorganic layer on the first flexible layer,
wherein a thickness of the first flexible layer is about 80% or more of a thickness of the capping layer.

### Claim 13 (depends on 12)

The method of claim 12,
wherein the first inorganic layer is formed by first plasma enhanced atomic layer deposition (PEALD) using polysilane,
wherein the second inorganic layer is formed by second PEALD using polysilane, and
wherein the first flexible layer is formed by plasma enhanced chemical vapor deposition (PECVD) using polysilane.

### Claim 14 (depends on 13)

The method of claim 13,
wherein a refractive index of the first inorganic layer is determined by a first plasma power of the first PEALD, and
wherein a refractive index of the second inorganic layer is determined by a second plasma power of the second PEALD.

### Claim 15 (depends on 13)

The method of claim 13,
wherein a refractive index of the first flexible layer is determined by a plasma power of the PECVD.

### Claim 16 (depends on 12)

The method of claim 12,
wherein the capping layer has a thickness from about 50 nm to about 90 nm.

### Claim 17 (depends on 12)

The method of claim 12,
wherein forming the capping layer further comprises:
forming a second flexible layer on the second inorganic layer; and
forming a third inorganic layer on the second flexible layer, and
wherein a sum of the thickness of the first flexible layer and a thickness of the second flexible layer is about 80% or more of the thickness of the capping layer.

### Claim 18 (depends on 17)

The method of claim 17,
wherein the second flexible layer is formed by plasma enhanced chemical vapor deposition (PECVD) using polysilane, and
wherein the third inorganic layer is formed by plasma enhanced atomic layer deposition (PEALD) using polysilane.

### Claim 19 (depends on 17)

The method of claim 17,
wherein the capping layer has a thickness from about 50 nm to about 90 nm.

### Claim 20 (depends on 12)

The method of claim 12,
wherein forming the encapsulation layer further comprises:
forming an organic encapsulation layer; and
forming an inorganic encapsulation layer on the organic encapsulation layer, and
wherein a lower surface of the organic encapsulation layer is in direct contact with an upper surface of the capping layer.