# US 12,119,382 B2 · Buffer layer structure to improve gan semiconductors

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- Number: US 12,119,382 B2
- Document ID: US12119382B2
- Status: Granted
- Kind: B2
- Application number: 18/181,272
- Filed: 2023-03-09
- Published: 2023-07-06
- Granted: 2024-10-15
- Earliest claimed: 2018-01-15
- Assignees: GlobalWafers Co., Ltd.
- Applicants: GlobalWafers Co., Ltd.
- Inventors: Jia-Zhe Liu; Yen Lun Huang; Chih-Yuan Chuang; Che Ming Liu; Wen-Ching Hsu; Manhsuan Lin
- Web page: https://patentgrep.com/patent/US12119382B2

## CPC

- H10D 62/824: comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
- H10D 62/8503: {Nitride Group III-V materials, e.g. AlN or GaN}
- H10P 14/3216: {Nitrides}
- H10P 14/3251: {consisting of three or more layers}
- H10P 14/24: using chemical vapour deposition [CVD]
- H10P 14/3252: {Alternating layers, e.g. superlattice}
- H10P 14/3254: {Graded layers}
- H10P 14/3414: {being group IIIA-VIA materials}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A heterostructure, includes: a substrate; and a buffer layer that includes a plurality of layers having a composition AlxInyGa1-x-yN, where x≤1 and y≥0; wherein the buffer layer has a first region that includes at least two layers, a second region that includes at least two layers, and a third region that includes at least two layers.

## Claims

### Claim 1

A heterostructure, comprising:
a substrate; and
a buffer layer comprising a plurality of layers having a composition AlxInyGa1-x-yN, where x≤1 and y≥0;
wherein the buffer layer has a first region, comprising at least two layers, one according to a first layer profile and another according to a second layer profile, wherein the first layer profile has a higher aluminum content than the second layer profile;
wherein the buffer layer has a second region comprising at least two layers, one according to a third layer profile and another according to a fourth layer profile, wherein the third layer profile has a higher aluminum content than the fourth layer profile and the fourth layer profile at any point along a growth direction has a lower aluminum content than the second layer profile of the first region at any point along the growth direction;
wherein the buffer layer has a third region comprising at least two layers, one according to a fifth layer profile and another according to a sixth layer profile, wherein the fifth layer profile has a higher aluminum content than the sixth layer profile and the sixth layer profile at any point along the growth direction has a lower aluminum content than the fourth layer profile of the second region at any point along the growth direction; and
wherein the aluminum content varies continuously throughout a thickness of the even numbered layer profiles.

### Claim 2 (depends on 1)

The heterostructure of claim 1, wherein the aluminum content varies continuously throughout a thickness of each individual layer.

### Claim 3 (depends on 1)

The heterostructure of claim 1, wherein the aluminum content varies continuously between the same content values throughout a thickness of the odd numbered layer profiles.

### Claim 4 (depends on 1)

The heterostructure of claim 1, wherein at least one pair of layer profiles selected from the first layer profile and second layer profile, third layer profile and fourth layer profile, and fifth layer profile and sixth layer profile repeats at least one time within the first region, second region, or third region, respectively.

### Claim 5 (depends on 1)

The heterostructure of claim 1, wherein the buffer layer has a thickness, measured in the growth direction, of at least 1 micrometer.

### Claim 6 (depends on 1)

The heterostructure of claim 1, wherein each individual layer independently has a thickness, measured in the growth direction, between about 1 nanometer and 50 nanometers.

### Claim 7 (depends on 1)

The heterostructure of claim 1, wherein the thickness of the layers with odd numbered layer profiles is substantially the same and/or the thickness of the layers with even numbered layer profiles is substantially the same.

### Claim 8 (depends on 7)

The heterostructure of claim 7, wherein the thickness of the layers with odd numbered layer profiles is different from the thickness of layers with even numbered layer profiles.

### Claim 9

A heterostructure, comprising:
a substrate;
a buffer layer having a composition AlxInyGa1-x-yN, where x≤1 and y≥0;
a plurality of layers; and
a first region comprising at least two layers, one with a first layer profile and another with a second layer profile, wherein the first layer profile has a continuously decreasing aluminum concentration and the second layer profile has a continuously increasing aluminum concentration;
a second region comprising at least two layers, one with a third layer profile and another with a fourth layer profile, wherein the third layer profile has a continuously decreasing aluminum concentration and the fourth layer profile has a continuously increasing aluminum concentration;
a third region comprising at least two layers, one with a fifth layer profile and another with a sixth layer profile, wherein the fifth layer profile has a continuously decreasing aluminum concentration and the sixth layer profile has a continuously increasing aluminum concentration; and
wherein the first layer profile terminates at an aluminum content that is higher than the aluminum content at the termination of the third layer profile.

### Claim 10 (depends on 9)

The heterostructure of claim 9, wherein the buffer layer has a plurality of layers and along a growth direction with the plurality of layers repeatedly changing from a layer of continuously increasing aluminum concentration to a layer of continuously decreasing aluminum concentration, or vice versa, and wherein each successive layer of continuously decreasing aluminum concentration in the growth direction terminates at a lower aluminum concentration than the previous layer of continuously decreasing aluminum concentration.

### Claim 11 (depends on 9)

The heterostructure of claim 9, wherein at least one pair of layer profiles selected from the first layer profile and second layer profile, third layer profile and fourth layer profile, and fifth layer profile and sixth layer profile repeats at least one time within the first region, second region, or third region, respectively.

### Claim 12 (depends on 9)

The heterostructure of claim 9, wherein the third layer profile terminates at an aluminum content that is higher than the aluminum content at the termination of the fifth layer profile.

### Claim 13 (depends on 11)

The heterostructure of claim 11, wherein along the growth direction of at least one of the first region, second region, or third region, respectively, each successive layer with continuously decreasing aluminum content terminates at a higher aluminum content; and
wherein the aluminum content at the termination of an initial layer having a third layer profile of the second region is lower than the aluminum content at the termination of the initial layer having a first layer profile of the first region; and
wherein the aluminum content at the termination of an initial layer having a fifth layer profile of the third region is lower than the aluminum content at the termination of the initial layer having a third layer profile of the second region.

### Claim 14 (depends on 11)

The heterostructure of claim 11, wherein along the growth direction of at least one of the first region, second region, or third region, respectively, each successive layer with continuously decreasing aluminum content terminates at a lower aluminum content; and
wherein the aluminum content at the termination of an initial layer having a third layer profile of the second region is lower than the aluminum content at the termination of the initial layer having a first layer profile of the first region but higher than the aluminum content at the termination of a terminally grown layer with continuously decreasing aluminum content of the first region; and
wherein the aluminum content at the termination of an initial layer having a fifth layer profile of the third region is lower than the aluminum content at the termination of the initial layer having a third layer profile of the second region but higher than the aluminum content at the termination of a terminally grown layer with continuously decreasing aluminum content of the second region.