# US 12,119,254 B2 · Electrostatic chuck assembly for plasma processing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,119,254 B2 - Document ID: US12119254B2 - Status: Granted - Kind: B2 - Application number: 18/524,484 - Filed: 2023-11-30 - Published: 2024-03-21 - Granted: 2024-10-15 - Earliest claimed: 2021-05-28 - Assignees: Beijing E-Town Semiconductor Technology Co., Ltd.; Mattson Technology, Inc. - Applicants: Beijing E-Town Semiconductor Technology Co., Ltd.; Mattson Technology, Inc. - Inventors: Maolin Long; Weimin Zeng - Web page: https://patentgrep.com/patent/US12119254B2 ## CPC - H10P 72/722: {Details of electrostatic chucks} - H10P 72/0434: {mainly by convection} - H10P 72/72: using electrostatic chucks - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract An electrostatic chuck including a clamping layer having a first clamping electrode and a second clamping electrode is disclosed. A first clamping electrode defining a first clamping zone and a second clamping zone is provided. The first clamping zone and the second clamping zone are separated by a first gap and are electrically connected by at least one electrical connection extending across the first gap. A second clamping electrode disposed radially outward from the first clamping electrode. The second clamping electrode defining a third clamping zone and a fourth clamping zone that are separated by a second gap. The third clamping zone and the fourth clamping zone are electrically connected by at least one electrical connection extending across the second gap. Plasma processing apparatuses and systems incorporating the electrostatic chuck are also provided. ## Claims ### Claim 1 An electrostatic chuck, comprising: a workpiece support surface configured to support a workpiece during processing; a thermal control system disposed within the electrostatic chuck; and a clamping layer including one or more clamping electrodes, the clamping layer including: a first clamping electrode defining a first clamping zone and a second clamping zone, the first clamping zone and the second clamping zone being separated by a first gap, the first clamping zone and the second clamping zone being electrically connected by at least one electrical connection extending across the first gap; and a second clamping electrode disposed radially outward from the first clamping electrode, the second clamping electrode defining a third clamping zone and a fourth clamping zone, the third clamping zone and the fourth clamping zone being separated by a second gap, the third clamping zone and the fourth clamping zone being electrically connected by at least one electrical connection extending across the second gap. ### Claim 2 (depends on 1) The electrostatic chuck of claim 1, wherein the thermal control system comprises one or more zones of release apertures. ### Claim 3 (depends on 2) The electrostatic chuck of claim 2, wherein the thermal control system comprises a first zone of release apertures, a second zone of release apertures, a third zone of release apertures and a fourth zone of release apertures. ### Claim 4 (depends on 3) The electrostatic chuck of claim 3, wherein the first zone of release apertures is disposed radially most inward, the second zone of release apertures disposed radially outward from the first zone of release apertures and radially inward from the third zone of release, the third zone of release apertures is disposed radially outward from the second zone of release apertures and radially inward from the fourth zone of release apertures, and the fourth zone of release apertures is disposed radially most outward. ### Claim 5 (depends on 3) The electrostatic chuck of claim 3, wherein the first zone of release apertures is disposed under the first clamping zone, the second zone of release apertures is disposed under the second clamping zone, the third zone of release apertures is disposed under the third clamping zone, and the fourth zone of release apertures is disposed under the fourth clamping zone. ### Claim 6 (depends on 3) The electrostatic chuck of claim 3, wherein the first zone of release apertures comprises fewer release apertures as compared to the second zone of release apertures, the third zone of release apertures, and the fourth zone of release apertures; wherein the second zone of release apertures includes fewer release apertures as compared to the third zone of release apertures and fourth zone of release apertures; wherein the third zone of release apertures comprises fewer release apertures as compared to the fourth zone of release apertures; and wherein the fourth zone of release apertures comprises a greater number of release apertures as compared to the first zone of release apertures, the second zone of release apertures, and the third zone of release apertures. ### Claim 7 (depends on 1) The electrostatic chuck of claim 1, wherein the thermal control system comprise one or more channels. ### Claim 8 (depends on 1) The electrostatic chuck of claim 1, comprising a sealing band disposed around an outer perimeter of the electrostatic chuck. ### Claim 9 (depends on 8) The electrostatic chuck of claim 8, wherein the sealing band is configured to seal thermal exchange fluid between a backside of the workpiece and the electrostatic chuck when the workpiece is chucked onto the electrostatic chuck. ### Claim 10 (depends on 8) The electrostatic chuck of claim 8, wherein the sealing band has a width ranging from about 3 mm to about 10 mm. ### Claim 11 (depends on 1) The electrostatic chuck of claim 1, comprising one or more heat exchange conduits disposed workpiece support surface and/or the clamping layer configured to allow for thermal exchange fluid to come in contact with a backside of the workpiece. ### Claim 12 A workpiece processing apparatus, comprising: a processing chamber; and a workpiece support disposed in the processing chamber, the workpiece support comprising: an electrostatic chuck including a workpiece support surface configured to support a workpiece during processing, a thermal control system, and a clamping layer including one or more clamping electrodes, the clamping layer including: a first clamping electrode defining a first clamping zone and a second clamping zone, the first clamping zone and the second clamping zone being separated by a first gap, the first clamping zone and the second clamping zone being electrically connected by at least one electrical connection extending across the first gap; and a second clamping electrode disposed radially outward from the first clamping electrode, the second clamping electrode defining a third clamping zone and a fourth clamping zone, the third clamping zone and the fourth clamping zone being separated by a second gap, the third clamping zone and the fourth clamping zone being electrically connected by at least one electrical connection extending across the second gap; wherein the first gap reduces thermal conduction between the first clamping zone and the second clamping zone, and wherein the second gap reduces thermal conduction between the third clamping zone and the fourth clamping zone. ### Claim 13 (depends on 12) The electrostatic chuck of claim 12, wherein the thermal control system comprises one or more zones of release apertures. ### Claim 14 (depends on 13) The electrostatic chuck of claim 13, wherein the thermal control system comprises a first zone of release apertures, a second zone of release apertures, a third zone of release apertures and a fourth zone of release apertures. ### Claim 15 (depends on 14) The electrostatic chuck of claim 14, wherein the first zone of release apertures is disposed radially most inward, the second zone of release apertures disposed radially outward from the first zone of release apertures and radially inward from the third zone of release, the third zone of release apertures is disposed radially outward from the second zone of release apertures and radially inward from the fourth zone of release apertures, and the fourth zone of release apertures is disposed radially most outward. ### Claim 16 (depends on 14) The electrostatic chuck of claim 14, wherein the first zone of release apertures is disposed under the first clamping zone, the second zone of release apertures is disposed under the second clamping zone, the third zone of release apertures is disposed under the third clamping zone, and the fourth zone of release apertures is disposed under the fourth clamping zone. ### Claim 17 (depends on 14) The electrostatic chuck of claim 14, wherein the first zone of release apertures comprises fewer release apertures as compared to the second zone of release apertures, the third zone of release apertures, and the fourth zone of release apertures; wherein the second zone of release apertures includes fewer release apertures as compared to the third zone of release apertures and fourth zone of release apertures; wherein the third zone of release apertures comprises fewer release apertures as compared to the fourth zone of release apertures; and wherein the fourth zone of release apertures comprises a greater number of release apertures as compared to the first zone of release apertures, the second zone of release apertures, and the third zone of release apertures. ### Claim 18 (depends on 12) The electrostatic chuck of claim 12, wherein the thermal control system comprise one or more channels. ### Claim 19 (depends on 12) The electrostatic chuck of claim 12, comprising a sealing band disposed around an outer perimeter of the electrostatic chuck, wherein the sealing band is configured to seal thermal exchange fluid between a backside of the workpiece and the electrostatic chuck when the workpiece is chucked onto the electrostatic chuck. ### Claim 20 A system for processing workpiece, the system comprising: a processing chamber, the processing chamber configured to perform at least one treatment process on a workpiece; a workpiece support disposed in the processing chamber, the workpiece support including an electrostatic chuck, the electrostatic chuck including: a workpiece support surface configured to support the workpiece during processing; a thermal control system; a clamping layer comprising one or more clamping electrodes, the clamping layer including: a first clamping electrode defining a first clamping zone and a second clamping zone, the first clamping zone and the second clamping zone being separated by a first gap, the first clamping zone and the second clamping zone being electrically connected by at least one electrical connection extending across the first gap; and a second clamping electrode disposed radially outward from the first clamping electrode, the second clamping electrode defining a third clamping zone and a fourth clamping zone, the third clamping zone and the fourth clamping zone being separated by a second gap, the third clamping zone and the fourth clamping zone being electrically connected by at least one electrical connection extending across the second gap; wherein the first gap reduces thermal conduction between the first clamping zone and the second clamping zone, and wherein the second gap reduces thermal conduction between the third clamping zone and the fourth clamping zone; and one or more power voltage sources coupled to the one or more clamping electrodes, the voltage sources configured to provide a DC offset adjustment to balance a clamping force or to adjust workpiece processing uniformity; and a controller, the controller configured to adjust a power output or a power voltage source from the one or more power voltage sources to the one or more clamping electrodes.