# US 12,119,203 B2 · Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

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- Number: US 12,119,203 B2
- Document ID: US12119203B2
- Status: Granted
- Kind: B2
- Application number: 17/739,830
- Filed: 2022-05-09
- Published: 2022-08-18
- Granted: 2024-10-15
- Earliest claimed: 2013-04-19
- Assignees: Canon Anelva Corporation
- Applicants: Canon Anelva Corporation
- Inventors: Yasushi Yasumatsu; Naoyuki Okamoto; Masashi Tsujiyama; Fumihito Suzuki
- Web page: https://patentgrep.com/patent/US12119203B2

## CPC

- H01J 37/3053: {for evaporating or etching}
- B08B 3/08: the liquid having chemical or dissolving effect
- H01J 27/024: {Extraction optics, e.g. grids}
- H01J 37/063: Geometrical arrangement of electrodes for beam-forming
- H01J 37/08: Ion sources; Ion guns
- H01J 37/3171: {for ion implantation}
- H01J 2237/022: Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
- H01J 2237/061: Construction
- H01J 2237/0815: Methods of ionisation
- H01J 2237/083: Beam forming
- H01J 2237/3151: Etching
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL

## Abstract

Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

## Claims

### Claim 1

A method of cleaning a first electrode included in an ion beam processing apparatus, the ion beam processing apparatus being configured to perform processing by ion beam irradiation, and provided with
an ion generation chamber including an ion generator,
a processing chamber in which the processing is performed and a holder to hold a substrate is disposed,
a plurality of electrodes configured to separate the ion generation chamber from the processing chamber, and to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber, the plurality of electrodes including
the first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and
a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions, and
a power unit configured to apply different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by the ion generator in the ion generation chamber,
in which a material of the first electrode is different from a material of the second electrode,
the method comprising the steps of:
preparing, as a cleaning agent, a solution having a rate to dissolve the material of the second electrode being higher than a rate to dissolve the material of the first electrode; and
selectively dissolving the material of the second electrode adhering to the first electrode from the first electrode by bringing the material of the second electrode adhering to the first electrode into a reaction with the solution of the cleaning agent.

### Claim 2 (depends on 1)

The method according to claim 1, wherein the cleaning is performed using a hydrofluoric acid solution as the cleaning agent.

### Claim 3 (depends on 1)

The method according to claim 1, wherein the cleaning is performed using a concentrated sulfuric acid solution, a concentrated nitric acid solution, or a mixed liquid thereof, as the cleaning agent.

### Claim 4 (depends on 1)

The method according to claim 1, wherein the cleaning is performed using a ferric chloride solution as the cleaning agent.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the cleaning is performed using a mixed solution of hydrofluoric acid and nitric acid as the cleaning agent.