Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsNicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov
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Abstract
Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
Claims20
A movable table apparatus for a lithographic tool that comprises a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object and the projection system, the movable table apparatus comprising:
- a table structure constructed to hold the object;
- a drain in the table structure configured to be in fluid communication with a gap extending along at least part of a periphery of the object, when the object is held by the table structure, such that at least part of the liquid enters the drain via the gap, the drain comprising:
- a chamber, and
- an opening in a surface of the table, the opening configured to provide fluid communication between the chamber and the gap,
- wherein the bottom of the chamber is at least 5 mm from the top surface of the object when the object is supported on the table structure.
A movable table apparatus for a lithographic tool that comprises a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object and the projection system, the movable table apparatus comprising:
- a table structure constructed to hold the object;
- a drain in the table structure configured to be in fluid communication with a gap extending along at least part of a periphery of the object, when the object is held by the table structure, such that at least part of the liquid enters the drain via the gap, the drain comprising:
- a chamber,
- an opening defined in an upper surface of the table located below the gap and providing fluid communication between the chamber and the gap,
- wherein a wall of the table structure extends at an angle down from the opening to the chamber.
A movable table apparatus for a lithographic tool that comprises a projection system configured to project a beam of radiation onto a surface and a liquid supply system configured to provide a liquid to a space between an object and the projection system, the movable table apparatus comprising:
- a table structure constructed to hold the object;
- a drain in the table structure configured to be in fluid communication with a gap extending along at least part of a periphery of the object, when the object is held by the table structure, such that at least part of the liquid enters the drain via the gap, the drain comprising:
- a chamber,
- an opening on an upper surface of the table providing fluid communication between the chamber and the gap, wherein the opening has a chamfer at the surface.
Dependencies are inferred from the claim text.