Manufacturing method of display panel and etching solution

An etching solution used for performing an etching process on a conductive layer stack of a display panel to form a patterned conductive layer stack, comprising:

• 1 to 3 wt % of nitric acid;
• 30 to 50 wt % of acetic acid;
• 30 to 50 wt % of phosphoric acid;
• and
• a remaining amount of water,
• wherein the conductive layer stack comprises a first sub-layer, a second sub-layer, and a third sub-layer, and the third sub-layer is disposed between the first sub-layer and the second sub-layer, the patterned conductive layer stack comprises a first patterned sub-layer, a second patterned sub-layer, and a third patterned sub-layer, and the third patterned sub-layer is disposed between the first patterned sub-layer and the second patterned sub-layer, the first sub-layer, the second sub-layer, and the third sub-layer are etched by the etching solution in the etching process to form the first patterned sub-layer, the second patterned sub-layer, and the third patterned sub-layer,
• wherein the first sub-layer and the first patterned sub-layer comprise molybdenum, the second sub-layer and the second patterned sub-layer comprise a transparent conductive material, the transparent conductive material comprises indium-containing oxide, and the third sub-layer and the third patterned sub-layer comprise silver or silver alloy.