An apparatus for treatment of gaseous pollutants comprising:
- a reaction portion, comprising:
- a gas inlet unit, comprising a first outer wall, a first inner wall, a first cooling chamber, a gas inlet chamber, and at least one guide conduit, the first cooling chamber mounted between the first outer wall and the first inner wall, the first inner wall defining the gas inlet chamber, the at least one guide conduit mounted on a side of the gas inlet chamber and introducing an effluent stream from a semiconductor manufacturing process to the gas inlet chamber;
- a reaction unit, coupled below the gas inlet unit, comprising a second outer wall, a second inner wall, a second cooling chamber and a reaction chamber, the second cooling chamber being defined between the second outer wall and the second inner wall, the second inner wall defining the reaction chamber, the reaction chamber and the gas inlet chamber communicating with each other to receive the effluent stream from the gas inlet chamber;
- a combustion unit, comprising at least one combustion assembly which comprises a pre-mixing section, an ignition plug, a first duct and a second duct, the first duct and the second duct are configured to introduce an oxidant and a fuel gas to the pre-mixing section, respectively, the ignition plug mounted adjacent to an opening end of the pre-mixing section, the opening end connected to the reaction chamber, the ignition plug is configured to generate a spark for igniting the oxidant and the fuel gas to provide a pilot flame to the reaction chamber through the opening end to burn the effluent stream;
- and
- a cooling unit, comprising a first pipe and a second pipe, the first pipe connected between a cooling source and the second cooling chamber, the second pipe connected between the second cooling chamber and the first cooling chamber, wherein the first cooling chamber and the second cooling chamber communicate with each other via the second pipe;
- and
- a passage connected to the reaction portion, comprising a transverse section, a connecting section and a vertical section, the transverse section substantially parallel to an extension of an installation plane of the apparatus for treatment of gaseous pollutants, the vertical section substantially perpendicular to the installation plane, the transverse section comprising a lateral gas inlet and a top gas inlet communicating with the reaction chamber of the reaction portion, the connecting section connected between the transverse section and the vertical section;
- wherein the top gas inlet receives the effluent stream flowing downward through the reaction portion, the lateral gas inlet receives a transverse gas flow, and the effluent stream is driven by the transverse gas flow to form a cyclone that is discharged through the connecting section and from an outlet of the vertical section opposite to the connecting section.