Selective liquid sliding surface and method of fabricating the same

A method of fabricating a selective liquid sliding surface, the method comprising:

• a mushroom-shaped silicone mold fabrication step in which a mushroom-shaped silicone mold is fabricated;
• a mushroom-shaped structure formation step in which the mushroom-shaped silicone mold is filled with a polymer material, followed by curing;
• and
• a surface fabrication step in which a surface having mushroom-shaped structures is fabricated by separating the mushroom-shaped silicone mold from the polymer material,
• wherein the mushroom-shaped silicone mold fabrication step comprises:
• a photoresist layer formation step in which a photoresist layer is formed on an upper surface of a silicon wafer;
• a first etching step in which the photoresist layer is etched in a pattern of multiple rings arranged at regular intervals and the upper surface of the silicon wafer using the etched photoresist layer as a mask;
• a photoresist layer removal step in which the photoresist layer is removed;
• a polysilicon layer formation step in which a silicon oxide layer is deposited on the silicon wafer and a polysilicon layer is formed on the silicon oxide layer;
• a second etching step in which the entire region of the polysilicon layer excluding circular regions each corresponding to an outer periphery of a corresponding one of multiple ring-shaped trenches is etched;
• a silicon dioxide layer formation step in which a silicon dioxide layer is formed on the silicon oxide layer and the polysilicon layer;
• a third etching step in which circular regions of the silicon dioxide layer corresponding to the respective multiple ring-shaped trenches are etched;
• and
• a polysilicon layer removal step in which the polysilicon layer is removed.