# US 12,112,931 B2 · Dual reverse pulse sputtering system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,112,931 B2 - Document ID: US12112931B2 - Status: Granted - Kind: B2 - Application number: 17/335,011 - Filed: 2021-05-31 - Published: 2021-09-16 - Granted: 2024-10-08 - Earliest claimed: 2015-04-27 - Assignees: Advanced Energy Industries, Inc. - Applicants: Advanced Energy Industries, Inc. - Inventors: Doug Pelleymounter - Web page: https://patentgrep.com/patent/US12112931B2 ## CPC - H01J 37/3476: {Testing and control} - C23C 14/3485: {using pulsed power to the target} - C23C 14/35: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} - C23C 14/352: {using more than one target (C23C14/56 takes precedence)} - C23C 14/562: {for coating elongated substrates} - H01J 37/3405: {Magnetron sputtering} - H01J 37/3438: {Electrodes other than cathode} - H01J 37/3444: {Associated circuits} - H01J 37/3467: {Pulsed operation, e.g. HIPIMS} - C23C 14/083: {of refractory metals or yttrium} - H01J 2237/2485: Electric or electronic means - H01J 2237/327: Arrangements for generating the plasma - H01J 2237/332: Coating - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A pulsed power system and a pulsed power sputtering system are disclosed. The pulsed power system includes a first power source that is configured to apply a first voltage at a first power lead that alternates between positive and negative relative to a second power lead during each of multiple cycles. A second power source is coupled to a third power lead and the second power lead, and the second power source is configured to apply a second voltage to the third power lead that alternates between positive and negative relative to the second power lead during each of the multiple cycles. A controller is configured to control the first power source and the second power source to phase-synchronize the first voltage with the second voltage, so both, the first voltage and the second voltage, are simultaneously negative during a portion of each cycle and simultaneously positive relative to the second power lead during another portion of each cycle. ## Claims ### Claim 1 A pulsed power system, comprising: a first power source coupled to a first power lead and a second power lead, the first power source configured to apply a first voltage at the first power lead that alternates between positive and negative relative to the second power lead during each of multiple cycles; a second power source coupled to a third power lead and the second power lead, the second power source configured to apply a second voltage to the third power lead that alternates between positive and negative relative to the second power lead during each of the multiple cycles; and a controller configured to control the first power source and the second power source to phase-synchronize the first voltage with the second voltage, so both, the first voltage and the second voltage, are simultaneously negative during a portion of each cycle and simultaneously positive relative to the second power lead during another portion of each cycle, wherein the first voltage at the first power lead and the second voltage at the third power lead are simultaneously negative relative to the second power lead at least 70 percent of a time over the multiple cycles. ### Claim 2 (depends on 1) The system of claim 1, wherein the controller is configured to control the first power source and the second power source, so both, the first voltage and the second voltage are simultaneously negative relative to the second power lead at least 80 percent of a time over the multiple cycles. ### Claim 3 (depends on 1) The system of claim 1, wherein: the controller includes a processor, and the controller is configured with a non-transitory memory comprising non-transitory instructions executable by the processor. ### Claim 4 (depends on 1) The system of claim 1, wherein: the controller includes a field programmable gate array, and the controller is configured with a non-transitory memory including non-transitory instructions accessible by the field programmable gate array to configure the field programmable gate array. ### Claim 5 (depends on 1) The system of claim 1, wherein: the first power source includes a first direct current power supply coupled to a first bi-polar controllable pulsed direct current power supply, the first bi-polar controllable pulsed direct current power supply is configured to provide an alternating direct current power to the first power lead and the second power lead; and the second power source comprises a second direct current power supply coupled to a second bi-polar controllable pulsed direct current power supply, the second bi-polar controllable pulsed direct current power supply is configured to provide an alternating direct current power to the third power lead and the second power lead. ### Claim 6 A non-transitory memory including non-transitory instructions that are at least one of executable by a processor to execute a method and accessible by a field programmable gate array to configure the field programmable gate array to execute the method, the method comprising: causing a first power source to apply a first voltage between first power lead and a second power lead, the first voltage at the first power lead alternates between positive and negative relative to the second power lead in a plasma chamber over multiple cycles; causing a second power source to apply a second voltage between a third power lead and the second power lead, the second voltage at the third power lead alternates between positive and negative relative to the second power lead over the multiple cycles; and causing the first power source and the second power source to phase-synchronize the first voltage with the second voltage, so both, the first voltage and the second voltage are simultaneously negative and simultaneously positive relative to the second power lead over the multiple cycles, wherein the voltages at the first power lead and the third power lead relative to the second power lead are negative at least 70 percent of a time over the multiple cycles. ### Claim 7 (depends on 6) The non-transitory memory of claim 6, wherein: the voltages at the first power lead and the third power lead relative to the second power lead are negative at least 80 percent of a time over the multiple cycles. ### Claim 8 (depends on 6) The non-transitory memory of claim 6, wherein: the voltages at the first power lead and the third power lead relative to the second power lead are negative between 70 and 90 percent of a time over the multiple cycles. ### Claim 9 (depends on 6) The non-transitory memory of claim 6, wherein: the first voltage has a positive magnitude that is the same as a negative magnitude of the first voltage; and the second voltage has a positive magnitude that is the same as a negative magnitude of the second voltage. ### Claim 10 A pulsed power sputtering system, comprising: a plasma chamber enclosing at least a first electrode, a second electrode, and a third electrode; means for applying a first voltage at the first electrode that alternates between positive and negative relative to the second electrode during each of multiple cycles; means for applying a second voltage to the third electrode that alternates between positive and negative relative to the second electrode during each of the multiple cycles; and means for phase-synchronizing the first voltage with the second voltage, so both, the first voltage and the second voltage are simultaneously negative during a portion of each cycle and simultaneously positive relative to the second electrode during another portion of each cycle, wherein the first voltage and the third voltage are simultaneously negative relative to the second electrode at least 70 percent of a time over the multiple cycles. ### Claim 11 (depends on 10) The system of claim 10, wherein: the means for phase-synchronizing comprises means for phase-synchronizing the first voltage with the second voltage so the first voltage and the third voltage are simultaneously negative relative to the second electrode at least 80 percent of the time over the multiple cycles. ### Claim 12 (depends on 10) The system of claim 10, wherein: the means for phase-synchronizing comprises means for phase-synchronizing the first voltage with the second voltage so the first voltage and the third voltage are simultaneously negative relative to the second electrode between 70 and 90 percent of a time over the multiple cycles. ### Claim 13 (depends on 10) The system of claim 10 comprising: means for applying, with a first power source, the first voltage at the first electrode that alternates between positive and negative relative to the second electrode wherein a magnitude of the positive and negative portions of each of the multiple cycles of the first voltage is the same; and means for applying, with a second power source, the second voltage at the third electrode that alternates between positive and negative relative to the second electrode wherein a magnitude of the positive and negative portions of each of the multiple cycles of the second voltage is the same.