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US 12,112,909 B2Granted
MEMS relay architecture with frequency isolation
AssigneeQorvo US, Inc.
InventorsRoberto Gaddi, Robertus Petrus Van Kampen
Life of this patent
Estimating the term…
Abstract
An electrical arrangement for performing radio frequency isolation for microelectromechanical relay switches. A microelectromechanical relay switch comprises a beam configured to switch from a first position connected to an upper voltage source to a second position connected to a lower voltage source. The microelectromechanical relay switch further comprises at least one frequency isolation circuit or resistor disposed adjacent to the beam. The at least one frequency isolation circuit or resistor biases a direct current potential to allow for electrostatic actuation and further provides a path for transient electrical currents during switching.
Claims16
An electrical arrangement, comprising:
- a first microelectromechanical relay, the first microelectromechanical relay comprising a beam element configured to switch from a first position adjacent to a first electrode to a second position adjacent a second electrode;
- a first RF electrode and second RF electrode configured to be either electrically isolated or electrically coupled to the beam element in the following manner depending on the beam element position:
- when the beam element is in the first position adjacent to the first electrode, the first and second RF electrodes are coupled to the beam element;
- and
- when the beam element is in the second position adjacent to the second electrode, the first and second RF electrodes are electrically isolated;
- a first isolation circuit coupled to the first electrode and configured to isolate a lower voltage source from the first electrode;
- and
- a second isolation circuit coupled to the second electrode and configured to isolate an upper voltage source from the second electrode;
- a third isolation circuit disposed between the beam element and the first RF electrode;
- and
- a fourth isolation circuit disposed between the beam element and the second RF electrode.
8 more elements
An electrical arrangement, comprising:
- a first and a second electrical arrangement, each of the first and the second electrical arrangement comprising:
- a first microelectromechanical relay, the first microelectromechanical relay comprising a beam element configured to switch from a first position adjacent to a first electrode to a second position adjacent a second electrode;
- a first RF electrode and second RF electrode configured to be either electrically isolated or electrically coupled to the beam element in the following manner depending on the beam element position:
- when the beam element is in the first position adjacent to the first electrode, the first and second RF electrodes are coupled to the beam element;
- and
- when the beam element is in the second position adjacent to the second electrode, the first and second RF electrodes are electrically isolated;
- a first isolation circuit coupled to the first electrode and configured to isolate a lower voltage source from the first electrode;
- and
- a second isolation circuit coupled to the second electrode and configured to isolate an upper voltage source from the second electrode;
- at least two first RF electrodes of the first and second electrical arrangements are coupled together;
- and
- at least two second RF electrodes of the first and the second electrical arrangements are coupled together
- a first isolation resistor coupled between the at least two first RF electrodes and to one of the at least two beam elements;
- and
- a second isolation resistor coupled between the at least two second RF electrodes and to one of the at least two beam elements.
12 more elements
An electrical arrangement, comprising:
- a first and a second electrical arrangement, each of the first and the second electrical arrangement comprising:
- a first microelectromechanical relay, the first microelectromechanical relay comprising a beam element configured to switch from a first position adjacent to a first electrode to a second position adjacent a second electrode;
- a first RF electrode and second RF electrode configured to be either electrically isolated or electrically coupled to the beam element in the following manner depending on the beam element position:
- when the beam element is in the first position adjacent to the first electrode, the first and second RF electrodes are coupled to the beam element;
- and
- when the beam element is in the second position adjacent to the second electrode, the first and second RF electrodes are electrically isolated;
- a first isolation circuit coupled to the first electrode and configured to isolate a lower voltage source from the first electrode;
- and
- a second isolation circuit coupled to the second electrode and configured to isolate an upper voltage source from the second electrode;
- at least two first RF electrodes of the first and second electrical arrangements are coupled together;
- and
- at least two second RF electrodes of the first and the second electrical arrangements are coupled together
- a first isolation resistor coupled between the at least two first RF electrodes and to one of the at least two beam elements;
- and
- a second isolation resistor coupled between the at least two second RF electrodes and to one of the at least two beam elements.
12 more elements
Dependencies are inferred from the claim text.