# US 12,111,573 B2 · Resist composition and method of forming resist pattern > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,111,573 B2 - Document ID: US12111573B2 - Status: Granted - Kind: B2 - Application number: 17/644,238 - Filed: 2021-12-14 - Published: 2022-06-30 - Granted: 2024-10-08 - Earliest claimed: 2020-12-23 - Assignees: Tokyo Ohka Kogyo Co., Ltd. - Applicants: Tokyo Ohka Kogyo Co., Ltd. - Inventors: Takuya Ikeda - Web page: https://patentgrep.com/patent/US12111573B2 ## CPC - G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors} - G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain} - G03F 7/20: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) - G03F 7/322: {Aqueous alkaline compositions} - G03F 7/40: Treatment after imagewise removal, e.g. baking - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic hydrocarbon group together with Ct, provided that part or all of hydrogen atoms contained in this monocyclic or polycyclic hydrocarbon group may be substituted with a substituent, and part of carbon atoms constituting a ring may be substituted with a hetero atom, and Ra01 represents a linear, branched, or cyclic aliphatic hydrocarbon group ## Claims ### Claim 1 A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising: a resin component (A1) which exhibits changed solubility in a developing solution under action of acid, wherein the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1): wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic hydrocarbon group together with Ct, provided that part or all of hydrogen atoms contained in the monocyclic or polycyclic hydrocarbon group may be substituted with a substituent, and part of carbon atoms constituting a ring may be substituted with a hetero atom, and Ra01 represents a linear, branched, or cyclic aliphatic hydrocarbon group. ### Claim 2 (depends on 1) The resist composition according to claim 1, further comprising an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) contains a compound represented by General Formula (b-1), a compound represented by General Formula (b-2), or a compound represented by General Formula (b-3): wherein R101 and R104 to R108 each independently represent a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, R104 and R105 may be bonded to each other to form a ring structure, R102 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Y101 represents a divalent linking group containing an oxygen atom or a single bond, V101 to V103 each independently represent a single bond, an alkylene group, or a fluorinated alkylene group, L101 and L102 each independently represent a single bond or an oxygen atom, L103 to L105 each independently represent a single bond, —CO—, or —SO2—, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or more. ### Claim 3 (depends on 2) The resist composition according to claim 2, wherein the acid generator component (B) contains a compound represented by General Formula (b-1-0): wherein R101 represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, Yb0 represents a divalent linking group containing an oxygen atom, V101 represents a single bond, an alkylene group, or a fluorinated alkylene group, R102 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or more. ### Claim 4 (depends on 3) The resist composition according to claim 3, wherein the acid generator component (B) contains a compound represented by General Formula (b-1-1): wherein R101 represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, Yb0 represents a divalent linking group containing an oxygen atom, V101 represents a single bond, an alkylene group, or a fluorinated alkylene group, R102 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Rb1 represents an aryl group having a fluorine atom or an aryl group having a fluorinated alkyl group, and Rb2 and Rb3 each independently represent an aryl group which may have a substituent or are bonded to each other to form a ring together with a sulfur atom in the formula. ### Claim 5 (depends on 1) The resist composition according to claim 1, wherein the constitutional unit (a01) is a constitutional unit represented by General Formula (a01-1): wherein R01 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 represents a divalent linking group, na01 represents an integer in a range of 0 to 2, Ct represents a tertiary carbon atom, and Xat represents a group that forms a monocyclic aliphatic hydrocarbon group together with Ct, provided that part or all of hydrogen atoms contained in the monocyclic aliphatic hydrocarbon group may be substituted with a substituent, and part of carbon atoms constituting a ring may be substituted with a hetero atom, and Ra01 represents a linear, branched, or cyclic aliphatic hydrocarbon group. ### Claim 6 (depends on 1) A method of forming a resist pattern, comprising: forming a resist film on a support using the resist composition according to claim 1; exposing the resist film; and developing the exposed resist film to form a resist pattern. ### Claim 7 (depends on 1) The resist composition according to claim 1, wherein the resin component (A1) has a constitutional unit (a01) represented by any one of General Formula (a01-1a-1) to (a01-1a-27): wherein Rα represents a hydrogen atom, a methyl group, or a trifluoromethyl group.