# US 12,111,572 B2 · Methods of greytone imprint lithography to fabricate optical devices > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,111,572 B2 - Document ID: US12111572B2 - Status: Granted - Kind: B2 - Application number: 18/333,290 - Filed: 2023-06-12 - Published: 2023-10-26 - Granted: 2024-10-08 - Earliest claimed: 2021-05-10 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Hao Tang; Kang Luo; Erica Chen; Yongan Xu - Web page: https://patentgrep.com/patent/US12111572B2 ## CPC - G03F 7/0005: {Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor} - G02B 5/1857: {using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams} - G02B 27/0172: {characterised by optical features} - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - G02B 2027/0178: {Eyeglass type (eyeglass details G02C)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS ## Abstract A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template. ## Claims ### Claim 1 A method of imprinting a pattern on a substrate, the method comprising: forming a first pattern on a plurality of masters, the first pattern including a plurality of patterned features; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; and using the first master to form a second pattern on an imprint template. ### Claim 2 (depends on 1) The method of claim 1, wherein the first pattern is formed on the plurality of masters using greytone photolithography. ### Claim 3 (depends on 1) The method of claim 1, further comprising imprinting the first pattern on a plurality of devices with the imprint template. ### Claim 4 (depends on 1) The method of claim 1, wherein each master includes a plurality of die spaced apart from each other, and using the first master to form to form the second pattern on the imprint template comprises imprinting the pattern from each die on the imprint template simultaneously. ### Claim 5 (depends on 1) The method of claim 1, wherein each master includes a plurality of die spaced apart from each other, and measuring the patterned features at a plurality of locations on each of the masters comprises performing measurements of the plurality of patterned features on each of the die. ### Claim 6 (depends on 1) The method of claim 1, further comprising using the first pattern formed on the first master to form a plurality of patterned features on an optical device. ### Claim 7 (depends on 6) The method of claim 6, wherein the plurality of patterned features of the optical device are a plurality of optical gratings of a waveguide combiner. ### Claim 8 A method of imprinting a pattern on a substrate, the method comprising: forming a first pattern on a plurality of die on each of a plurality of masters, the first pattern on each die including a plurality of patterned features; measuring the patterned features at a plurality of locations on each die on each of the masters; selecting a first die on a first master of the plurality of masters based on the measurements of the patterned features on each die of each of the masters; and using the first die on the first master to form a second pattern on an imprint template. ### Claim 9 (depends on 8) The method of claim 8, further comprising: imprinting the first pattern on a first die of a first device with the imprint template; and imprinting the first pattern on a second die of the first device with the imprint template. ### Claim 10 (depends on 9) The method of claim 9, further comprising imprinting the first pattern on a plurality of devices other than the first device with the imprint template. ### Claim 11 (depends on 8) The method of claim 8, wherein the first pattern is formed on the plurality of masters using greytone photolithography. ### Claim 12 (depends on 8) The method of claim 8, further comprising using the first pattern formed on the first master to form a plurality of patterned features on an optical device. ### Claim 13 (depends on 12) The method of claim 12, wherein the plurality of patterned features of the optical device are a plurality of optical gratings of a waveguide combiner. ### Claim 14 (depends on 8) The method of claim 8, wherein the first die of the first master is selected based on the measurements of the patterned features of the first die having a least amount of variance from an intended design out of all of the die on all of the plurality of masters. ### Claim 15 A method of imprinting a pattern on a substrate, the method comprising: forming a first pattern on a plurality of die on each of a plurality of masters using a method other than imprinting, the first pattern on each die including a plurality of patterned features; measuring the patterned features at a plurality of locations on each die on each of the masters; selecting a first die on a first master of the plurality of masters based on the measurements of the patterned features on each die of each of the masters; using the first die on the first master to form a second pattern on a first imprint template; imprinting the first pattern on each die of a plurality of die of a new master with the first imprint template; and using the plurality of die on the new master to form the second pattern on each die of a plurality of die on a second imprint template. ### Claim 16 (depends on 15) The method of claim 15, wherein the first pattern is formed on the plurality of masters using greytone photolithography. ### Claim 17 (depends on 15) The method of claim 15, further comprising imprinting the first pattern on a plurality of devices with the second imprint template. ### Claim 18 (depends on 15) The method of claim 15, further comprising using the first pattern formed on the first master to form a plurality of patterned features on an optical device. ### Claim 19 (depends on 18) The method of claim 18, wherein the plurality of patterned features of the optical device are a plurality of optical gratings of a waveguide combiner. ### Claim 20 (depends on 15) The method of claim 15, wherein the first die of the first master is selected based on the measurements of the patterned features of the first die having a least amount of variance from an intended design out of all of the die on all of the plurality of masters.