Apparatus for fabricating semiconductor device having upper and lower inlets for supplying supercritical fluids and method of fabricating semiconductor device using the same

An apparatus for fabricating a semiconductor device, the apparatus comprising:

• a chamber configured to accommodate a substrate coated with a first fluid and including a first region and a second region;
• a drain cup which is placed between a lower wall of the chamber and the substrate, the drain cup including:
• a first portion of which a width, in a horizontal direction, decreases toward the lower wall of the chamber, and
• a second portion connected to the first portion and fixedly attached to a first position of the lower wall of the chamber,
• wherein the first region and the second region are separated from each other by the second portion attached to the first position of the lower wall of the chamber;
• a lower inlet which is placed in the lower wall of the chamber and is configured to provide a first supercritical fluid into the chamber;
• an upper inlet which is placed in an upper wall of the chamber, and is configured to provide a second supercritical fluid into the chamber;
• and
• a fluid outlet which is placed in the lower wall of the chamber, is connected to the second portion of the drain cup, and discharges a second fluid which is a mixture of the first fluid and the first supercritical fluid to outside of the chamber,
• wherein the first region is a region between the drain cup and an inner wall of the chamber, and the second region is a region surrounded by the drain cup, and wherein the first position of the lower wall of the chamber is disposed between the lower inlet and the fluid outlet,
• wherein the drain cup further includes a connecting groove formed in the first portion of the drain cup, and
• wherein at least a part of a first protrusion portion of the chamber is inserted into the connecting groove of the drain cup.