Aromatic polyamide films for transparent flexible substrates

A transparent film having a glass transition temperature greater than approximately 300° C. and a coefficient of thermal expansion of less than approximately 20 ppm/° C., consisting essentially of an aromatic copolyamide characterized by:

• at least two repeat structures, wherein one of the repeat structures is repeat structure (V)
• wherein n=1 to 4;
• where Y is the molar ratio of the repeat structure (V) with respect to all other repeat structures, and Y is from 0.01 to 0.10;
• wherein Ar1 is selected from the group comprising:
• wherein p=4, q=3, and wherein R1, R2, R3, R4, R5 are selected from the group comprising hydrogen, halogen (fluoride, chloride, bromide, and iodide), alkyl, substituted alkyl such as halogenated alkyls, nitro, cyano, thioalkyl, alkoxy, substituted alkoxy such as a halogenated alkoxy, aryl, or substituted aryl such as halogenated aryls, alkyl ester and substituted alkyl esters, and combinations thereof, wherein G1 is selected from a group comprising a covalent bond;
• a CH2 group;
• a C(CH3)2 group;
• a C(CF3)2 group;
• a C(CX3)2 group, wherein X is a halogen;
• a CO group;
• an O atom;
• a S atom;
• a SO2 group;
• a Si(CH3)2 group;
• 9, 9-fluorene group;
• substituted 9, 9-fluorene;
• and an OZO group, wherein Z is a aryl group or substituted aryl group, such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, and substituted 9, 9-bisphenylfluorene;
• wherein Ar2 is selected from the group comprising:
• wherein p=4, wherein R6, R7, R8 are selected from the group comprising hydrogen, halogen (fluoride, chloride, bromide, and iodide), alkyl, substituted alkyl such as halogenated alkyls, nitro, cyano, thioalkyl, alkoxy, substituted alkoxy such as a halogenated alkoxy, aryl, substituted aryl such as halogenated aryls, alkyl ester, and substituted alkyl esters, and combinations thereof, wherein G2 is selected from a group comprising a covalent bond;
• a CH2 group;
• a C(CH3)2 group;
• a C(CF3)2 group;
• a C(CX3)2 group, wherein X is a halogen;
• a CO group;
• an O atom;
• a S atom;
• a SO2 group;
• a Si(CH3)2 group;
• 9, 9-fluorene group;
• substituted 9, 9-fluorene;
• and an OZO group, wherein Z is a aryl group or substituted aryl group, such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, and substituted 9, 9-bisphenylfluorene;
• wherein Ar3 is selected from the group comprising:
• wherein m=1 or 2, wherein t=1 to 3, wherein R9, R10, R11 are selected from the group comprising hydrogen, halogen (fluoride, chloride, bromide, and iodide), alkyl, substituted alkyl such as halogenated alkyls, nitro, cyano, thioalkyl, alkoxy, substituted alkoxy such as halogenated alkoxy, aryl, substituted aryl such as halogenated aryls, alkyl ester, and substituted alkyl esters, and combinations thereof, wherein G3 is selected from a group comprising a covalent bond;
• a CH2 group;
• a C(CH3)2 group;
• a C(CF3)2 group;
• a C(CX3)2 group, wherein X is a halogen;
• a CO group;
• an O atom;
• a S atom;
• a SO2 group;
• a Si(CH3)2 group;
• 9, 9-fluorene group;
• substituted 9, 9-fluorene;
• and an OZO group, wherein Z is a aryl group or substituted aryl group, such as phenyl group, biphenyl group, perfluorobiphenyl group, 9, 9-bisphenylfluorene group, and substituted 9, 9-bisphenylfluorene.