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US 12,107,178 B2Granted
Method of fabricating a sensor device
AssigneeHimax Technologies Limited
InventorsYu-Jui Hsieh, Po-Nan Chen, Ya-Jing Yang
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Abstract
A sensor device provided in the disclosure includes a sensor substrate, a first transparent layer, a collimator layer, and a lens. The first transparent layer is disposed on the sensor substrate, wherein the first transparent layer defines an alignment structure. The collimator layer is disposed on the first transparent layer. The lens is disposed on the collimator layer.
Claims7
A method of fabricating a sensor device, comprising:
- forming a transparent material layer on a sensor substrate;
- patterning the transparent material into a first transparent layer, wherein the first transparent layer defines an alignment structure and a padding portion beside the alignment structure;
- coating a material layer on the sensor substrate, wherein a portion of the material layer covering the alignment structure is staggered along with the alignment structure;
- and
- patterning the material layer using the staggered portion as an alignment mark, wherein the material layer is patterned by
- aligning a photomask to the sensor substrate using the staggered portion;
- performing an exposure on the material layer through the photomask;
- and
- developing the material layer so that the staggered portion is removed to expose the alignment structure while another portion of the material layer on the padding portion forms a collimator layer.
6 more elements
Dependencies are inferred from the claim text.