System and method for testing a filter
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChwen Yu, En Tian Lin, Chi Wen Kuo
Life of this patent
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Abstract
A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.
Claims20
A method for testing a filter, comprising:
- providing a first testing solution with a number of particles;
- detecting the number of the particles in the first testing solution by a first particle counter;
- passing the first testing solution through the filter;
- detecting the number of the particles in the first testing solution, which is passed through the filter, by a second particle counter;
- and
- calculating a first data detected by the first particle counter and a second data detected by the second particle counter to obtain a filter retention efficiency of the filter;
- wherein the number of the particles in the first testing solution is known and a particle size of the particles in the first testing solution is known, and wherein the number of the particles in the first testing solution is 100/ml to 500/ml and the particle size of the particles in the first testing solution is 20 nanometers to 50 nanometers.
A method for testing a filter for filtering ultrapure water used in semiconductor manufacturing, comprising:
- providing a first testing solution, wherein the first testing solution comprises nanometer-sized particles and wherein a number of the nanometer-sized particles in the first testing solution is known and a particle size of the nanometer-sized particles in the first testing solution is known;
- detecting the first testing solution to obtain a first value regarding the number of the nanometer-sized particles in the first testing solution;
- passing the first testing solution through the filter;
- detecting the first testing solution to obtain a second value regarding the number of the nanometer-sized particles in the first testing solution;
- and
- obtaining a filter retention efficiency of the filter based on the first value and the second value;
- wherein the number of the nanometer-sized particles in the first testing solution is 100/ml to 500/ml and the particle size of the nanometer-sized particles in the first testing solution is 20 nanometers to 50 nanometers.
A method for testing a filter for filtering ultrapure water used in semiconductor manufacturing, comprising:
- preparing a test solution by diluting a concentration solutions, wherein the concentration solution comprises nanometer-sized particles;
- providing the test solution in a container, wherein the test solution comprises the nanometer-sized particles from the concentration solution, and wherein a number of the nanometer-sized particles in the test solution is 100/ml to 500/ml and a particle size of the nanometer-sized particles in the testing solution is 20 nanometers to 50 nanometers;
- drawing the test solution from the container into a first passageway;
- detecting the nanometer-sized particles of the test solution by a first particle counter connected to the first passageway;
- passing the test solution through the filter;
- drawing the test solution into a second passageway;
- detecting the nanometer-sized particles of the test solution by a second particle counter connected to the second passageway;
- and
- obtaining a filter retention efficiency of the filter based on results detected by the first particle counter and the second particle counter.
Dependencies are inferred from the claim text.