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US 12,104,245 B2Granted
Compound, thin-film forming raw material that contains said compound, and method of manufacturing thin film
AssigneeAdeka Corporation
InventorsAtsushi Sakurai, Masako Hatase, Masaki Enzu, Keisuke Takeda, Ryota Fukushima, Atsushi Yamashita
Life of this patent
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Abstract
Provided is a thin-film forming raw material containing a compound represented by the following formula (1): in the formula (1), R1 to R5 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group containing a fluorine atom, M represents a metal atom, and “n” represents a valence of the metal atom represented by M, provided that at least one of R2, R3, and R4 represents the group containing a fluorine atom.
Claims5
A compound represented by the following formula (1):
- in the formula (1), R1 to R5 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group containing a fluorine atom, M represents a metal atom, and “n” represents a valence of the metal atom represented by M, provided that R1 and R5 each represent an alkyl group having 1 to 5 carbon atoms, at least one of R2 and R4 represents an alkyl group having 1 to 5 carbon atoms substituted with a fluorine atom, and R3 represents a hydrogen atom.
Dependencies are inferred from the claim text.