Baking chamber with shroud for mask clean

A baking chamber for baking a photomask, comprising:

• a chamber body enclosing an interior volume;
• a heater disposed in the interior volume;
• a shroud disposed in the interior volume opposite the heater, wherein the shroud has a conical shape and includes a central opening fluidly coupled to a gas inlet;
• a plurality of substrate lift pins configured to support the photomask in the interior volume between the heater and the shroud such that the heater heats the photomask via convection, wherein the shroud includes a plurality of first openings to facilitate movement of the plurality of substrate lift pins through the shroud;
• a gas outlet disposed in the chamber body opposite the shroud such that a gas flow path through the interior volume extends from the gas inlet to a region within the shroud, around the heater, and to the gas outlet;
• and
• an edge ring disposed on a plurality of edge ring lift pins and configured to surround the substrate, wherein the plurality of edge ring lift pins extend through a plurality of second openings in the shroud.