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US 12,085,499 B2Granted
Flow cells
AssigneeIllumina, Inc.
InventorsSahngki Hong, M. Shane Bowen, Lewis J. Kraft, Sharis Minassian
Life of this patent
Estimating the term…
Abstract
One example of a flow cell includes a base support and a multi-layer stack positioned over the base support. The multi-layer stack includes a resin layer positioned over the base support; and a hydrophobic layer positioned over the resin layer. A depression is defined in the multi-layer stack through the hydrophobic material and through a portion of the resin.
Claims36
A method, comprising:
- defining a depression in a multi-layer stack including a hydrophobic layer over a resin layer by:
- imprinting through a depth of the hydrophobic layer and through a portion of a depth of the resin layer using a working stamp;
- applying a sacrificial layer over a first portion of the depression, whereby a second portion of the depression is exposed;
- applying a functionalized layer over the sacrificial layer and over the second portion of the depression;
- removing the sacrificial layer to expose the first portion of the depression;
- and
- applying a second functionalized layer over the first portion of the depression.
4 more elements
A method, comprising:
- defining a depression in a resin layer of a substrate by:
- applying a photoresist to the resin layer;
- developing the photoresist to define a depression pattern where soluble photoresist is removed and an interstitial pattern where insoluble photoresist remains over the resin layer;
- etching the resin layer at the depression pattern;
- and
- removing the insoluble photoresist;
- applying a sacrificial layer over a first portion of the depression, whereby a second portion of the depression remains exposed;
- applying a first functionalized layer over the sacrificial layer and over the second portion of the depression;
- removing the sacrificial layer and the first functionalized layer applied thereon, thereby exposing the first portion of the depression;
- applying a second functionalized layer over the second portion of the depression;
- and
- attaching respective primers sets to the first and second functionalized layers.
9 more elements
A method, comprising:
- imprinting a resin layer to form a concave region including a deep portion, and a shallow portion defined by a step portion, wherein the resin layer is positioned over a multi-layer stack including at least two layers having differential etching rates, which is positioned over a base support;
- selectively etching the resin layer and the at least two layers to form a depression adjacent to the deep portion;
- applying a first functionalized layer to the depression;
- selectively etching the resin layer, the at least two layers, or combinations thereof to expose a region underlying the step portion;
- and
- applying a second functionalized layer to the exposed region.
3 more elements
A method, comprising:
- applying a first functionalized layer over a substrate including a concave region having a deep portion, and a shallow portion defined by a step portion;
- patterning the first functionalized layer, thereby forming a first functionalized region covered by a photoresist in the deep portion adjacent to the step portion;
- dry etching the substrate to remove the step portion and form a depression adjacent to the functionalized region;
- and
- applying a second functionalized layer over the substrate and the photoresist.
2 more elements
A method, comprising:
- imprinting an additional resin layer to form a concave region therein, wherein the additional resin layer is positioned over a poly(methyl methacrylate) lift-off layer that is positioned over a first resin layer;
- exposing a portion of the first resin layer underlying the concave region by etching a first portion of the additional resin layer and a first portion of the poly(methyl methacrylate) lift-off layer;
- etching i) the additional resin layer to expose a second portion of the poly(methyl methacrylate) lift-off layer and ii) the exposed portion of the first resin layer to form a depression in the first resin layer;
- applying a functionalized layer over the depression and the second portion of the poly(methyl methacrylate) lift-off layer;
- and
- removing the second portion of the poly(methyl methacrylate) lift-off layer and the functionalized layer thereon.
3 more elements
A method, comprising:
- imprinting a resin layer to form a convex region, wherein the resin layer is positioned over a multi-layer stack including a lift-off resist over a functionalized layer over a substrate;
- selectively etching portions of the resin layer, the lift-off resist, and the functionalized layer to expose portions of the substrate, whereby other portions of the lift-off resist and the functionalized layer that are adjacent to the convex region remain intact;
- and
- lifting off the other portion of the lift-off resist.
1 more element
A method, comprising:
- imprinting a resin to form a convex region, wherein the resin is positioned over a multi-layer stack including a sacrificial layer over a substrate;
- selectively etching portions of the resin and the sacrificial layer around the convex region to expose a portion of the substrate;
- patterning a photoresist to cover the exposed portion of the substrate;
- exposing a second portion of the substrate underlying the sacrificial layer;
- applying a functionalized layer over the exposed second portion of the substrate;
- and
- lifting off the photoresist.
4 more elements
Dependencies are inferred from the claim text.