Measurement apparatus and method
AssigneeRenishaw PLC
InventorsBenjamin Jason Merrifield, Graham Richard Ferguson
Life of this patent
Estimating the term…
Abstract
A measurement apparatus for mounting within an enclosure of a machine is described. The apparatus includes a measurement device and a protection means for protecting the measurement device from contaminants present within the machine enclosure. The protection means is switchable between at least a first mode that protects the measurement device from contaminants and a second mode that provides less protection of the measurement device from contaminants than the first mode. A contaminant sensor is used for sensing contamination within the machine enclosure and thereby determining when the protection means can adopt the second mode. A corresponding method is also described.
Claims16
A measurement apparatus for mounting within an enclosure of a machine, comprising;
- a measurement device, and
- a protection means for protecting the measurement device from contaminants present within the enclosure, the protection means being switchable between at least a first mode that protects the measurement device from contaminants and a second mode that provides less protection of the measurement device from contaminants than the first mode, wherein
- the apparatus comprises a contaminant sensor for sensing contamination within the enclosure, the sensed contamination being used to determine when the protection means can adopt the second mode, and
- the measurement device comprises an optical tool-setting device having a transmitter for passing light to a receiver along an optical beam path into which a tool to be measured can be inserted.
A method for operating a measurement apparatus mounted within the enclosure of a machine, the measurement apparatus comprising (a) a measurement device that includes an optical tool-setting device having a transmitter for passing light to a receiver along an optical beam path into which a tool to be measured can be inserted and (b) a protection means for protecting the measurement device from contaminants present within the enclosure, the protection means being switchable between at least a first mode that protects the measurement device from contaminants and a second mode that provides less protection of the measurement device from contaminants than the first mode,
- wherein the method comprises the steps of:
- (i) sensing an amount of contamination within the enclosure, and
- (ii) determining when the protection means can adopt the second mode based on the amount of contamination sensed in step (i).
A measurement apparatus for mounting within an enclosure of a machine, comprising;
- a measurement device, and
- a shutter for protecting the measurement device from ingress of contaminants present within the enclosure, the shutter being switchable between at least a first mode that protects the measurement device from contaminants and a second mode that provides less protection of the measurement device from the ingress of contaminants than the first mode, the shutter providing a larger aperture in the second mode than in the first mode, wherein
- the apparatus comprises a contaminant sensor for sensing contamination within the enclosure, the sensed contamination being used to determine when the shutter can adopt the second mode.
A measurement apparatus for mounting within an enclosure of a machine, comprising;
- a measurement device, and
- a protection means for protecting the measurement device from contaminants present within the enclosure, the protection means being switchable between at least a first mode that protects the measurement device from contaminants and a second mode that provides less protection of the measurement device from contaminants than the first mode, wherein
- the apparatus comprises a contaminant sensor for sensing contamination within the enclosure, the sensed contamination being used to determine when the protection means can adopt the second mode, and
- the measurement device comprises a measurement sensor, wherein a single sensor provides both the measurement sensor and the contaminant sensor.
Dependencies are inferred from the claim text.