Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product
AssigneeBASF SE
InventorsI Chen Chou, Andreas Klipp, Berthold Ferstl
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AssigneeBASF SE
InventorsI Chen Chou, Andreas Klipp, Berthold Ferstl
Estimating the term…
Described is a composition comprising as primary surfactant an ionic compound comprising one or more fluoroalkyl groups and as secondary surfactant at least one non-ionic compound comprising one or more polyalkyloxy and/or polyalkylenoxy groups, for cleaning or rinsing a product, preferably a product used in the semiconductor industry, and a respective use of said composition. Further described is a method of making a cleaned or rinsed product, preferably a product used in the semiconductor industry, comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below, comprising the step of cleaning or rinsing said product with the composition of the invention.
A composition for cleaning or rinsing a product, comprising:
Dependencies are inferred from the claim text.