Coating composition for pattern inversion

A coating composition coating an organic underlayer film pattern formed by transferring a resist pattern to an underlayer, the coating composition comprising a polysiloxane obtained by a reaction of an alcohol with a silanol group in a hydrolysis-condensate of a hydrolysable silane having a hydrolysable silane containing in the molecule four hydrolysable groups, in a ratio of 50% by mole to 100% by mole relative to the total amount of silanes;

• wherein in the polysiloxane to be obtained, a ratio of the silanol group to the silanol group reacted with the alcohol ((silanol group):(silanol group reacted with the alcohol)) is 100:1 to 1:100,
• wherein the hydrolysable silane is represented by Formula (1):
• R1aSi(R2)4-a Formula (1)
• wherein R1 is an alkyl group, an aryl group, a halogenated alkyl group, a halogenated aryl group, an alkoxyaryl group, an alkenyl group, or an organic group having an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, or a cyano group and bonded to a silicon atom through a Si—C bond, R2 is an alkoxy group, an acyloxy group, or a halogen atom, and a is an integer of 0 to 3;
• and contains 50% by mole to less than 100% by mole of a hydrolysable silane in which a is 0 and more than 0% by mole to 50% by mole of a hydrolysable silane in which a is 1 or 2,
• wherein the polysiloxane is formed from only hydrolysable silanes represented by Formula (1), and
• wherein the coating composition is used for coating a patterned organic underlayer film, the patterned organic underlayer film is formed by etching a silicon hard mask layer through a resist pattern and etching an organic underlayer film through the patterned silicon hard mask layer.