Substrate processing method, recording medium, and substrate processing apparatus

A substrate processing method, comprising:

• performing a developing processing on a substrate,
• wherein the developing processing comprises:
• supplying a developing liquid on a surface of the substrate to form a liquid film of the developing liquid on the surface of the substrate;
• maintaining the liquid film of the developing liquid on the surface of the substrate such that development progresses on the surface of the substrate;
• and
• performing, during the maintaining of the liquid film of the developing liquid on the surface of the substrate, a first processing of supplying a gas to an inner region located inward of a peripheral region on the surface of the substrate and a second processing of supplying an adjusting liquid configured to suppress progress of the development on the peripheral region to adjust a degree of the development between the peripheral region and the inner region, and
• wherein the second processing is started after a start time of the first processing, and the second processing is ended after an end time of the first processing.