Vacuum processing apparatus

A vacuum processing apparatus comprising:

• a stage on which a substrate is placed;
• and
• a shutter configured to be able to move between a shielding position at which the stage is covered and a retracted position that is retracted from the shielding position,
• wherein the shutter arranged at the shielding position forms a processing space between the shutter and the stage,
• wherein the shutter includes:
• a support member;
• a support pillar provided at an end of the support member;
• a gas supplier provided in the support member and configured to supply a gas into the processing space;
• and
• a gas exhauster provided closer to a center side of the processing space than the gas supplier and configured to exhaust the gas from the processing space,
• wherein the gas supplier includes:
• a first gas supplier configured to supply a first gas into the processing space from an outer peripheral portion of the shutter, the first gas supplier being formed in an annular shape in a plan view;
• and
• a second gas supplier configured to supply a second gas into the processing space from a central portion of the shutter, the second gas supplier being formed in an annular shape in the plan view,
• wherein the gas exhauster is arranged in an annular shape between the first gas supplier and the second gas supplier in the plan view, and
• wherein the gas exhauster is formed so as to penetrate the gas supplier in a thickness direction of the gas supplier.