Method for collecting dust from single crystal growth system
AssigneeGlobalWafers Co., Ltd.
InventorsMasami Nakanishi, Yu-Sheng Su, I-Ching Li
Life of this patent
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Abstract
A method for collecting dust from a single crystal growth system includes providing dry air and oxygen into an exit pipe connecting to the single crystal growth system, blowing a first inert gas into the exit pipe to compel the dust oxide toward a dust collecting device, collecting the dust oxide by the dust collecting device; and providing a rotary pump to transport residues of the dust oxide backward. The oxygen reacts with the unstable dust for forming dust oxide. The exit pipe is used to exhaust unstable dust from the single crystal growth system.
Claims10
A method for collecting dust from a single crystal growth system, comprising steps as follows:
- providing dry air and oxygen into an exit pipe connecting to the single crystal growth system, the oxygen reacting with unstable dust for forming dust oxide so as to stabilize the dust in the exit pipe, wherein the exit pipe is used to exhaust the unstable dust from the single crystal growth system;
- blowing a first inert gas into the exit pipe to compel the dust oxide toward a dust collecting device;
- collecting the dust oxide by the dust collecting device;
- and
- providing a rotary pump to transport residues of the dust oxide from an outlet of the dust collecting device to an inlet of the rotary pump.
Dependencies are inferred from the claim text.