Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added

A resist underlayer film-forming composition comprising a novolac resin having a structure group (C) as an additional group that is obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B) in the presence of an aldehyde, and a solvent selected form the group consisting of propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and mixtures thereof,

• wherein the aromatic ring-containing compound (A) is an aromatic amine compound selected from the group consisting of phenylindole and phenylnaphthylamine,
• wherein the aromatic vinyl compound (B) is styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene,
• wherein the aldehyde is naphthaldehyde or pyrenecarboxyaldehyde,
• wherein the aromatic ring-containing compound (A) and the aromatic vinyl compound (B) are reacted at a molar ratio (A):(B) of 1:0.1 to 8.0,
• wherein the novolac resin is a resin produced by a reaction of the aromatic amine compound with the aldehyde, and
• wherein the structure group (C) is represented by Formula (2):
• wherein in Formula (2), Ar1, R1 and R2 are each a group derived from the aromatic vinyl compound (B), wherein Ar1 is a phenyl group or a napththyl group, R1 is hydrogen, tert-butyl or tert-butoxy, m is 1 and R2 is a hydrogen atom, and A1 is a group derived from the aromatic ring structure of the aromatic ring-containing compound (A).

A resist underlayer film-forming composition comprising

• a novolac resin, and
• wherein the novolac resin has a structure group (C) as an additional group that is obtained by addition reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B) having one vinyl group in the molecule in the presence of an aldehyde,
• wherein the aromatic ring-containing compound (A) and the aromatic vinyl compound (B) are reacted at a molar ratio (A):(B) of 1:0.1 to 8.0,
• wherein the aromatic ring-containing compound (A) is an aromatic amine compound selected from the group consisting of phenylindole and phenylnaphthylamine,
• wherein the structure group (C) is represented by Formula (2):
• wherein in Formula (2), Ar1, R1 and R2 are each a group derived from the aromatic vinyl compound (B), wherein Ar1 is a phenyl group, R1 is a hydroxyl group, R2 is a phenyl group, and m is 1, and A1 is a group derived from the aromatic ring structure of the aromatic ring-containing compound (A).

A resist underlayer film-forming composition comprising a novolac resin having a structure group (C) as an additional group that is obtained by addition reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B) having one vinyl group in the molecule,

• wherein the aromatic ring-containing compound (A) and the aromatic vinyl compound (B) are reacted at a molar ratio (A):(B) of 1:0.1 to 8.0,
• wherein the aromatic ring-containing compound (A) is an aromatic amine compound selected from the group consisting of phenylindole and phenylnaphthylamine,
• wherein the structure group (C) is represented by Formula (2):
• wherein in Formula (2), Ar1, R1 and R2 are each a group derived from the aromatic vinyl compound (B), wherein Ar1 is a C6-40 aryl group, R1 is a C1-10 alkyl group, a C6-40 aryl group, a hydroxyl group, a cyano group, a nitro group, an amino group, a carboxyl group, an acetyl group, a hydroxymethyl group, a halogenomethyl group, a —Y—Z group, a halogen atom, or a combination of these, Y is an oxygen atom, a sulfur atom, a carbonyl group, or an ester group, Z is a C1-10 alkyl group, R2 is a phenyl group, and m is an integer of 0 to (5+2n), wherein n is the condensation degree of an aromatic ring constituting the aryl group as defined by Ar1, and A1 is a group derived from the aromatic ring structure of the aromatic ring-containing compound (A).