Systems, devices, and methods for high quality ion beam formation
AssigneeTae Technologies, Inc.
InventorsAlexander Dunaevsky, Artem N. Smirnov, Alexandr A. Ivanov, Vladislav Vekselman
Life of this patent
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Abstract
Embodiments of systems, devices, and methods relate to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.
Claims20
A beam system, comprising:
- a particle source configured to emit a charged particle beam;
- a pre-accelerator system configured to accelerate the charged particle beam from the particle source;
- an accelerator configured to accelerate the charged particle beam from the pre-accelerator system;
- a first vacuum pump chamber positioned between the pre-accelerator system and the accelerator, wherein the first vacuum pump chamber is configured to remove gas exiting the accelerator into the pre-accelerator system;
- and
- a second vacuum pump chamber positioned between the particle source and the pre-accelerator system.
A method of operating a beam system, the method comprising:
- emitting a beam comprising charged particles from a particle source;
- accelerating the beam with a pre-accelerator system towards an accelerator;
- accelerating the beam with the accelerator;
- removing gas exiting the accelerator into the pre-accelerator system using a first vacuum pump chamber;
- and
- removing gas exiting the pre-accelerator system into the particle source using a second vacuum pump chamber.
A beam system, comprising:
- a particle source configured to emit a charged particle beam;
- a pre-accelerator system configured to accelerate the charged particle beam from the particle source;
- an accelerator configured to accelerate the charged particle beam from the pre-accelerator system;
- a first vacuum pump chamber positioned between the pre-accelerator system and the accelerator;
- and
- a second vacuum pump chamber positioned between the particle source and the pre-accelerator system, wherein the second vacuum pump chamber is configured to remove gas exiting the pre-accelerator system into the particle source.
Dependencies are inferred from the claim text.