Laminated film structure and method for manufacturing laminated film structure
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsKazuya Shimada, Masahito Hayamizu, Toshihiko Sakata, Makoto Chakuno
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Abstract
Method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.
Claims9
A method for manufacturing a laminated film structure comprising:
- forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, the to-be-treated object being made of an insulator or an insulator having a conductive layer formed on the surface thereof in advance;
- removing fluorine in the oxide layer;
- forming a catalyst layer by bringing the oxide layer into contact with a catalyst liquid;
- and
- forming a metal film on the catalyst layer by an electroless plating method.
Dependencies are inferred from the claim text.