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US 12,068,154 B2Granted
Method of forming a nitrogen-containing carbon film and system for performing the method
AssigneeASM IP Holding B.V.
InventorsHirotsugu Sugiura, Yoshiyuki Kikuchi
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Abstract
Methods and systems for forming a forming a nitrogen-containing carbon film and structures formed using the methods or systems are disclosed. Exemplary methods include providing a precursor with carbon-terminated carbon-nitrogen bonds. The methods can further include providing a reactant to the reaction chamber.
Claims13
A method of forming a nitrogen-containing carbon film, the method comprising the steps of:
- providing a precursor to a reaction chamber, wherein a chemical formula of the precursor comprises
- a cyclic compound having a cyclic structure comprising C, H, and N;
- and
- forming the nitrogen-containing film on a surface of a substrate using the precursor,
- wherein the precursor comprises a carbon-terminated carbon-nitrogen bond and wherein the precursor is selected from one or more of the group consisting of 1,3,5-trimethylhexahydro-1,3,5-triazine, 2,4,6-trimethyl-s-triazene, and 1-methyl-2-pyrrolidinone.
2 more elements
Dependencies are inferred from the claim text.