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US 12,066,418 B2Granted
Method for measuring concentration of fluorine gas contained in halogen fluoride-containing gas by ultra violet spectroscopy
AssigneeResonac Corporation
InventorAtsushi Suzuki
Life of this patent
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Abstract
A method for measuring the concentration of fluorine gas, which includes irradiating a halogen fluoride-containing gas with ultraviolet light in which the ratio (WX/WF) of the maximum value (WX) of ultraviolet light intensity in the wavelength region of less than 250 nm with respect to the ultraviolet light intensity (WF) at a wavelength of 285 nm is 1/10 or less, and measuring the absorbance at a wavelength of 285 nm to obtain the concentration of fluorine gas contained in the halogen fluoride-containing gas.
Claims8
A method for measuring a concentration of fluorine gas, the method comprising:
- irradiating a halogen fluoride-containing gas with ultraviolet light in which a ratio (WX/WF) of a maximum value (WX) of ultraviolet light intensity in a wavelength region of less than 250 nm with respect to an ultraviolet light intensity (WF) at a wavelength of 285 nm is 1/10 or less;
- and
- measuring an absorbance at a wavelength of 285 nm to obtain a concentration of fluorine gas contained in the halogen fluoride-containing gas.
Dependencies are inferred from the claim text.