Particle removal method in semiconductor fabrication process

A system, comprising:

• a processing tool;
• a gas handling housing fluidly communicating with the processing tool;
• a filtering assembly positioned in the gas handling housing and comprising a plurality of wire meshes, wherein the wire meshes are stacked on top of another;
• and
• a liquid spraying member positioned in the gas handling housing and configured to spray a mist over the wire meshes,
• wherein the wire meshes which are stacked collectively form a tubular-shaped filtering structure, and the liquid spraying member is surrounded by the tubular-shaped filtering structure,
• wherein each of the wire meshes comprises a plurality of three dimensional structures, and each of the three dimensional structures includes:
• a plurality of first filaments extending in an X-axis direction, wherein in a Y-axis direction, every two adjacent first filaments are arranged in pairs, and the pairs of the first filaments are stacked in a Z-axis direction, wherein a distance between each pair of the first filaments decreases along the Z-axis direction;
• and
• a plurality of second filaments extending in the Y-axis direction, wherein in the X-axis direction, every two adjacent second filaments are arranged in pairs, and the pairs of the second filaments are stacked in the Z-axis direction, wherein a distance between each pair of the second filaments decreases along the Z-axis direction.

A system, comprising:

• a processing tool;
• a gas handling housing fluidly communicating with the processing tool;
• a filtering assembly positioned in the gas handling housing and comprising a plurality of wire meshes, wherein the wire meshes are stacked on top of another;
• and
• a liquid spraying member positioned in the gas handling housing and configured to spray a mist over the wire meshes,
• wherein the wire meshes which are stacked collectively form a tubular-shaped filtering structure, and the liquid spraying member is surrounded by the tubular-shaped filtering structure,
• wherein each of the wire meshes comprises a plurality of three dimensional structures, and each of the three dimensional structures includes:
• a plurality of first filaments extending in an X-axis direction and arranged parallel to each other in a Y-axis direction;
• and
• a plurality of second filaments extending in the Y-axis and arranged parallel to each other in the X-axis direction,
• wherein, the first filaments and the second filaments are woven such that, when observed from a top view of the three-dimensional structure, the number of second filaments located underneath one of the first filaments that passes through the center of the three-dimensional structure is greater than the number of second filaments located underneath another one of the first filaments that is immediately adjacent to the one of the first filaments passing through the center of the three-dimensional structure.